Publisher's Note: Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N[sub 2]O Gas [Electrochem. Solid-State Lett., 13, G13 (2010)]

2010 ◽  
Vol 13 (4) ◽  
pp. S3
Author(s):  
Seok-Jun Won ◽  
Sungin Suh ◽  
Sang Woon Lee ◽  
Gyu-Jin Choi ◽  
Cheol Seong Hwang ◽  
...  
2010 ◽  
Vol 13 (2) ◽  
pp. G13 ◽  
Author(s):  
Seok-Jun Won ◽  
Sungin Suh ◽  
Sang Woon Lee ◽  
Gyu-Jin Choi ◽  
Cheol Seong Hwang ◽  
...  

Author(s):  
Benjamin Rich ◽  
Yael Etinger-Geller ◽  
G. Ciatto ◽  
A Katsman ◽  
Boaz Pokroy

Size effects and structural modifications in amorphous TiO2 films deposited by atomic layer deposition (ALD) were investigated. As with the previously investigated ALD-deposited Al2O3 system we found that the film’s...


2017 ◽  
Vol 29 (8) ◽  
pp. 3740-3753 ◽  
Author(s):  
Alexander J. Pearse ◽  
Thomas E. Schmitt ◽  
Elliot J. Fuller ◽  
Farid El-Gabaly ◽  
Chuan-Fu Lin ◽  
...  

2014 ◽  
Vol 118 (39) ◽  
pp. 22611-22619 ◽  
Author(s):  
Yu Lei ◽  
Bin Liu ◽  
Junling Lu ◽  
Joseph A. Libera ◽  
Jeffrey P. Greeley ◽  
...  

2015 ◽  
Vol 26 (6) ◽  
pp. 064002 ◽  
Author(s):  
Giuseppe Fiorentino ◽  
Sten Vollebregt ◽  
F D Tichelaar ◽  
Ryoichi Ishihara ◽  
Pasqualina M Sarro

2018 ◽  
Vol 30 (8) ◽  
pp. 2526-2534 ◽  
Author(s):  
David M. Stewart ◽  
Alexander J. Pearse ◽  
Nam S. Kim ◽  
Elliot J. Fuller ◽  
A. Alec Talin ◽  
...  

Nano Letters ◽  
2020 ◽  
Vol 20 (9) ◽  
pp. 6884-6890
Author(s):  
Wang Ke ◽  
Yang Liu ◽  
Xuelong Wang ◽  
Xiangdong Qin ◽  
Limei Chen ◽  
...  

2019 ◽  
Vol 13 (1) ◽  
pp. 453-457 ◽  
Author(s):  
Raija Matero ◽  
Suvi Haukka ◽  
Marko Tuominen

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