The Impact of Pre/Post-metal Deposition Annealing on Negative-Bias-Temperature Instability in HfO2 Stack p-Channel Metal-Oxide-Semiconductor Field Effect Transistors
2006 ◽
Vol 45
(4B)
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pp. 3064-3069
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2014 ◽
Vol 43
(4)
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pp. 1207-1213
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2007 ◽
Vol 46
(4B)
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pp. 2011-2014
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2013 ◽
Vol 52
(3R)
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pp. 036503
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2007 ◽
Vol 46
(4B)
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pp. 1874-1878
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