The Impact of Pre/Post-metal Deposition Annealing on Negative-Bias-Temperature Instability in HfO2 Stack p-Channel Metal-Oxide-Semiconductor Field Effect Transistors

2015 ◽  
Vol 4 (8) ◽  
pp. Q37-Q39 ◽  
Author(s):  
Y.-H. Lu ◽  
T.-C. Chang ◽  
S.-H. Ho ◽  
C.-E. Chen ◽  
J.-Y. Tsai ◽  
...  
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