The Dry Etching Characteristics of HfAlO3Thin Films in CF4/Cl2/Ar Inductively Coupled Plasma

2011 ◽  
Vol 159 (1) ◽  
pp. D26-D30 ◽  
Author(s):  
Jong-Chang Woo ◽  
Tae-Kyung Ha ◽  
Chang-Il Kim
Keyword(s):  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Inductively Coupled

Low Bias Voltage Dry Etching of InP by Inductively Coupled Plasma Using SiCl4/Ar

1998 ◽  
Vol 37 (Part 1, No. 12A) ◽  
pp. 6655-6656 ◽  
Author(s):  
Akihiro Matsutani ◽  
Fumio Koyama ◽  
Kenichi Iga
Keyword(s):  
Bias Voltage ◽  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Inductively Coupled

Angled stripe InGaAsP/InP SLED fabricated by low-damage inductively coupled plasma dry etching

2004 ◽  
Author(s):  
Jun Zhang ◽  
Xiaodong Huang ◽  
Jin Chang ◽  
Yingjun Liu ◽  
Yi Gan ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Inductively Coupled

Dry Etching of TaN/HfO2Gate Stack Structure by Cl2/SF6/Ar Inductively Coupled Plasma

2005 ◽  
Vol 44 (7B) ◽  
pp. 5811-5818 ◽  
Author(s):  
Myoung Hun Shin ◽  
Sung-Woong Na ◽  
Nae-Eung Lee ◽  
Tae Kwan Oh ◽  
Jiyoung Kim ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Inductively Coupled

scholarly journals III-nitride dry etching: Comparison of inductively coupled plasma chemistries

1999 ◽  
Vol 17 (4) ◽  
pp. 2202-2208 ◽  
Author(s):  
H. Cho ◽  
Y.-B. Hahn ◽  
D. C. Hays ◽  
C. R. Abernathy ◽  
S. M. Donovan ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Dry Etching ◽  
Inductively Coupled

Dry etching characteristics of TiO2 thin films using inductively coupled plasma for gas sensing

Vacuum ◽  
2014 ◽  
Vol 107 ◽  
pp. 20-22 ◽  
Author(s):  
I. Hotovy ◽  
S. Hascik ◽  
M. Gregor ◽  
V. Rehacek ◽  
M. Predanocy ◽  
...  
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Gas Sensing ◽  
Dry Etching ◽  
Tio2 Thin Films ◽  
Inductively Coupled
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