Surface Modification of Lithium Titanate Electrode with Atomic Layer Deposited Oxide Coating to Improve Cycling Stability at Low Voltage

2011 ◽  
Keyword(s):  
Surface Modification ◽  
Low Voltage ◽  
Oxide Coating ◽  
Atomic Layer ◽  
Lithium Titanate ◽  
Cycling Stability

scholarly journals Evaluation of Bacterial Adhesion to the ZrO2 Atomic Layer Deposited on the Surface of Cobalt-Chromium Dental Alloy Produced by DMLS Method

Materials ◽  
2021 ◽  
Vol 14 (5) ◽  
pp. 1079
Author(s):  
Anna Ziębowicz ◽  
Agata Sambok-Kiełbowicz ◽  
Witold Walke ◽  
Aldona Mzyk ◽  
Kamil Kosiel ◽  
...  
Keyword(s):  
Surface Modification ◽  
Bacterial Adhesion ◽  
Zirconium Oxide ◽  
Oxide Coating ◽  
Atomic Layer ◽  
Direct Metal Laser Sintering ◽  
Cobalt Chromium ◽  
Innovative Method ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method

The main purpose of the research was to analyze the influence of surface modification of the cobalt-based alloy used in dental prosthetics by applying zirconium oxide (ZrO2) layers using the ALD (Atomic Layer Deposition) method. The samples were made using the DMLS (Direct Metal Laser Sintering) technique, and their surfaces were prepared in accordance with the principles of removable partial dentures (RPDs). A 50 nm-thick zirconium oxide coating was applied to the prepared substrates. This paper deals with the issues of prosthetic stomatopathy, which is a complex of pathological changes occurring in approx. 40% of the Polish population using removable dentures. Often, these changes, occurring on the mucosa, are related to improper performance, allergic reactions or the multiplication of bacteria on the surface of partial dentures. An innovative method of surface modification was proposed, together with the analysis of its influence on the physicochemical properties of the alloy and the adhesion of bacteria to the surface.

Dual-protection of a graphene-sulfur composite by a compact graphene skin and an atomic layer deposited oxide coating for a lithium-sulfur battery

Nanoscale ◽  
2015 ◽  
Vol 7 (12) ◽  
pp. 5292-5298 ◽  
Author(s):  
Mingpeng Yu ◽  
Aiji Wang ◽  
Fuyang Tian ◽  
Hongquan Song ◽  
Yinshu Wang ◽  
...  
Keyword(s):  
Oxide Coating ◽  
Atomic Layer ◽  
Lithium Sulfur Battery ◽  
Dual Protection ◽  
Sulfur Battery ◽  
Lithium Sulfur

Surface Modification of Carbon Post Arrays by Atomic Layer Deposition of ZnO Film

2011 ◽  
Vol 11 (8) ◽  
pp. 7322-7326 ◽  
Author(s):  
Hyun Ae Lee ◽  
Young-Chul Byun ◽  
Umesh Singh ◽  
Hyoung J. Cho ◽  
Hyoungsub Kim
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zno Film ◽  
Layer Deposition

Atomic layer deposition-triggered hierarchical core/shell stable bifunctional electrocatalysts for overall water splitting

2021 ◽  
Vol 9 (37) ◽  
pp. 21132-21141
Author(s):  
T. Kavinkumar ◽  
Selvaraj Seenivasan ◽  
Hyeonjung Jung ◽  
Jeong Woo Han ◽  
Do-Heyoung Kim
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Water Splitting ◽  
Atomic Layer ◽  
Core Shell ◽  
Interface Engineering ◽  
Bifunctional Electrocatalyst ◽  
Overall Water Splitting ◽  
Bifunctional Electrocatalysts ◽  
Layer Deposition

A synergistic strategy of interface engineering and surface modification is efficient to construct a promising bifunctional electrocatalyst for enhanced electrocatalytic water splitting.

Improving Powder Characteristics by Surface Modification Using Atomic Layer Deposition

2019 ◽  
Vol 23 (11) ◽  
pp. 2362-2368 ◽  
Author(s):  
Cosima Hirschberg ◽  
Nikolaj Sølvkær Jensen ◽  
Johan Boetker ◽  
Anders Østergaard Madsen ◽  
Tommi O. Kääriäinen ◽  
...  
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Powder Characteristics

scholarly journals Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

2021 ◽  
Author(s):  
Jerome W. F. Innocent ◽  
Mari Napari ◽  
Andrew L. Johnson ◽  
Thom R. Harris-Lee ◽  
Miriam Regue ◽  
...  
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition ◽  
Scale Surface

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor.

Sign in / Sign up

Export Citation Format

Share Document