scholarly journals Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

2021 ◽  
Author(s):  
Jerome W. F. Innocent ◽  
Mari Napari ◽  
Andrew L. Johnson ◽  
Thom R. Harris-Lee ◽  
Miriam Regue ◽  
...  
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition ◽  
Scale Surface

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor.

Atomic scale surface engineering of micro- to nano-sized pharmaceutical particles for drug delivery applications

Nanoscale ◽  
2017 ◽  
Vol 9 (32) ◽  
pp. 11410-11417 ◽  
Author(s):  
D. Zhang ◽  
M. J. Quayle ◽  
G. Petersson ◽  
J. R. van Ommen ◽  
S. Folestad
Keyword(s):  
Drug Delivery ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Ambient Conditions ◽  
Surface Layers ◽  
Layer Deposition ◽  
Atomic Surface ◽  
Scale Surface

Few atomic surface layers via atomic layer deposition under near ambient conditions significantly altered dissolution and dispersion of pharmaceutical particles.

Atomic-scale surface modifications and novel electrode designs for high-performance sodium-ion batteries via atomic layer deposition

2017 ◽  
Vol 5 (21) ◽  
pp. 10127-10149 ◽  
Author(s):  
Xiangbo Meng
Keyword(s):  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Surface Modifications ◽  
Sodium Ion ◽  
Atomic Scale ◽  
Sodium Ion Batteries ◽  
Layer Deposition ◽  
Scale Surface

This review summarized the research efforts using atomic layer deposition for high-performance sodium-ion batteries.

Atomic‐scale designing of zeolite‐based catalysts by atomic layer deposition

ChemPhysChem ◽  
2021 ◽  
Author(s):  
Dan Xu ◽  
Junqing Yin ◽  
Ya Gao ◽  
Di Zhu ◽  
Shuyuan Wang
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition

Surface Modification of Carbon Post Arrays by Atomic Layer Deposition of ZnO Film

2011 ◽  
Vol 11 (8) ◽  
pp. 7322-7326 ◽  
Author(s):  
Hyun Ae Lee ◽  
Young-Chul Byun ◽  
Umesh Singh ◽  
Hyoung J. Cho ◽  
Hyoungsub Kim
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zno Film ◽  
Layer Deposition

Atomic layer deposition-triggered hierarchical core/shell stable bifunctional electrocatalysts for overall water splitting

2021 ◽  
Vol 9 (37) ◽  
pp. 21132-21141
Author(s):  
T. Kavinkumar ◽  
Selvaraj Seenivasan ◽  
Hyeonjung Jung ◽  
Jeong Woo Han ◽  
Do-Heyoung Kim
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Water Splitting ◽  
Atomic Layer ◽  
Core Shell ◽  
Interface Engineering ◽  
Bifunctional Electrocatalyst ◽  
Overall Water Splitting ◽  
Bifunctional Electrocatalysts ◽  
Layer Deposition

A synergistic strategy of interface engineering and surface modification is efficient to construct a promising bifunctional electrocatalyst for enhanced electrocatalytic water splitting.

Improving Powder Characteristics by Surface Modification Using Atomic Layer Deposition

2019 ◽  
Vol 23 (11) ◽  
pp. 2362-2368 ◽  
Author(s):  
Cosima Hirschberg ◽  
Nikolaj Sølvkær Jensen ◽  
Johan Boetker ◽  
Anders Østergaard Madsen ◽  
Tommi O. Kääriäinen ◽  
...  
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Powder Characteristics

scholarly journals Integrated Sustainability Analysis of Atomic Layer Deposition for Microelectronics Manufacturing

2010 ◽  
Vol 132 (3) ◽  
Author(s):  
Chris Y. Yuan ◽  
David A. Dornfeld
Keyword(s):  
Atomic Layer Deposition ◽  
Energy Flow ◽  
Scale Up ◽  
Atomic Layer ◽  
Development Stage ◽  
Layer Growth ◽  
Atomic Scale ◽  
Sustainability Analysis ◽  
Layer Deposition ◽  
Integrated Sustainability

Atomic layer deposition (ALD) is a promising nanotechnology for wide applications in microelectronics manufacturing due to its ability to control layer growth at atomic scale. Sustainability of ALD technology needs to be quantitatively investigated in this early development stage to improve its economic and environmental performance. In this paper, we present an integrated sustainability analysis of ALD technology through material and energy flow analyses. The study is performed on the ALD of Al2O3 high-κ dielectric film through trimethylaluminum and water binary reactions. The precursor utilizations, methane emissions, and nanowaste generations from the ALD process are all quantitatively studied. Energy flow analysis demonstrates that the ALD process energy consumption is mainly determined by the ALD cycle time rather than the process temperature. Scale-up performance of the ALD technology is also studied for both emission generations and energy consumptions. Strategies and methods for improving the sustainability performance of the ALD technology are suggested based on the analysis.

Surface modification and fabrication of 3D nanostructures by atomic layer deposition

MRS Bulletin ◽  
2011 ◽  
Vol 36 (11) ◽  
pp. 887-897 ◽  
Author(s):  
Changdeuck Bae ◽  
Hyunjung Shin ◽  
Kornelius Nielsch
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
3D Nanostructures ◽  
Layer Deposition ◽  
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