scholarly journals Defects Origin on Epitaxial Silicon Layer on a Double-Porous Silicon Layer

1999 ◽  
Vol 557 ◽  
Author(s):  
L. Stalmans ◽  
A.A. Abouelsaood ◽  
M.Y. Ghannam ◽  
J. Poortmans ◽  
H. Bender ◽  
...  

AbstractThe random medium model for porous silicon (PS) is applied to a porous silicon layer to be used as a back reflector in a thin film silicon solar cell realized in an ultrathin epitaxially grown Si layer on PS. Three-layer-structures (epi/PS/Si) have been fabricated by RPCVD of 150-1000 nm epitaxial silicon layers on the porous surface of silicon wafers. The light reflection has been measured in the 300-1000 nm wavelength range. An excellent agreement is found between the experimentally measured reflectance curves and those calculated using the random medium model. The analysis shows that the epitaxial growth has led to an appreciable reduction in the porosity in the intermediate PS layer from about 60% to 20-30%.


2020 ◽  
Vol 12 (4) ◽  
pp. 04020-1-04020-5
Author(s):  
A. P. Oksanich ◽  
◽  
S. E. Pritchin ◽  
M. A. Mashchenko ◽  
A. Yu. Bobryshev ◽  
...  

2017 ◽  
Vol 68 (7) ◽  
pp. 53-57 ◽  
Author(s):  
Martin Kopani ◽  
Milan Mikula ◽  
Daniel Kosnac ◽  
Jan Gregus ◽  
Emil Pincik

AbstractThe morphology and chemical bods of p-type and n-type porous Si was compared. The surface of n-type sample is smooth, homogenous without any features. The surface of p-type sample reveals micrometer-sized islands. FTIR investigation reveals various distribution of SiOxHycomplexes in both p-and n-type samples. From the conditions leading to porous silicon layer formation (the presence of holes) we suggest both SiOxHyand SiFxHycomplexes in the layer.


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