(Invited) Computer Simulation of Intrinsic Point Defect Distribution
Valid for All Pulling Conditions in Large-Diameter Czochralski Si Crystal
Growth
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2019 ◽
Vol 8
(4)
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pp. P228-P238
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2018 ◽
Vol 2018.31
(0)
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pp. 006
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Influence of anisotropic thermal stress during Si crystal growth on intrinsic point defect formation
2017 ◽
Vol 2017.30
(0)
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pp. 087
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2012 ◽
Vol 351
(1)
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pp. 115-117
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2012 ◽
Vol 209
(10)
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pp. 1880-1883
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2009 ◽
Vol 156-158
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pp. 217-222
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2009 ◽
Vol 6
(8)
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pp. 1906-1911
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