scholarly journals Raman Spectroscopy of Amorphous Carbon Prepared by Pulsed Arc Discharge in Various Gas Mixtures

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
M. Marton ◽  
M. Vojs ◽  
E. Zdravecká ◽  
M. Himmerlich ◽  
T. Haensel ◽  
...  
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Gas Flow ◽  
Arc Discharge ◽  
Hydrogen Gas ◽  
Deposition Parameters ◽  
Scattering Geometry ◽  
Pulsed Arc Discharge ◽  
Application Requirements ◽  
Pulsed Arc

To meet various application requirements, it is important to enable an improvement of a-C structure and properties, such as hardness, adhesion, and wear resistance. In this study, we used the Raman spectroscopy to investigate the a-C thin films structure dependence on the different deposition parameters. The effect of nitrogen, argon, and hydrogen gas flow rate was analyzed to determine the influence on the film properties. The change in the gas type, combination, and flow had a significant influence on the D and G bands of the a-C Raman spectra. The addition of N2into the chamber promoted the sp2creation, while with adding hydrogen the layer contained more sp3bonds. The depositions of a-C thin films were carried out in pulsed arc discharge vacuum installation. Micro-Raman measurements of the deposited materials were performed using an ISA Dilor-Jobin Yvon-Spex Labram confocal system with 632.8 nm radiation from a He-Ne laser using a back-scattering geometry.

Properties of TiAl and TiAlN Thin Films by Pulsed Cathodic ARC

2007 ◽  
Vol 534-536 ◽  
pp. 1413-1416
Author(s):  
S.Y. Chun ◽  
Chung Hyo Lee ◽  
Sang Jin Lee
Keyword(s):  
Thin Films ◽  
Arc Discharge ◽  
Deposition Process ◽  
Al Alloy ◽  
Si Substrates ◽  
Cathodic Arc Deposition ◽  
Pulsed Arc Discharge ◽  
Cathodic Arc ◽  
Pulsed Arc ◽  
Arc Deposition

TiAl and TiAlN thin films are deposited on glassy carbon and Si substrates by the pulsed cathodic arc deposition process. In our pulsed cathodic arc system, because the spatial position of plasma on the surface of the evaporation source can be controlled by pulsed arc discharge, the thickness of the TiAl and TiAlN films can be controlled at nanometer scale. Amorphous stoichiometric Ti-Al films are synthesized from one Ti-Al alloy target at room temperature by changing the number of pulses of the arc discharge.

In situ surface oxide reduction with pulsed arc discharge for maximum adhesion of diamond-like carbon coatings

2008 ◽  
Vol 17 (12) ◽  
pp. 2071-2074 ◽  
Author(s):  
Veli-Matti Tiainen ◽  
Antti Soininen ◽  
Esa Alakoski ◽  
Yrjö T. Konttinen
Keyword(s):  
Arc Discharge ◽  
Surface Oxide ◽  
Diamond Like Carbon ◽  
Oxide Reduction ◽  
Carbon Coatings ◽  
Pulsed Arc Discharge ◽  
Pulsed Arc

Production of nitric oxide using a pulsed arc discharge

2002 ◽  
Vol 30 (5) ◽  
pp. 1993-1998 ◽  
Author(s):  
T. Namihira ◽  
S. Katsuki ◽  
R. Hackam ◽  
H. Akiyama ◽  
K. Okamoto
Keyword(s):  
Nitric Oxide ◽  
Arc Discharge ◽  
Pulsed Arc Discharge ◽  
Pulsed Arc

Synthesis of graphene nanosheets from petroleum asphalt by pulsed arc discharge in water

2013 ◽  
Vol 215-216 ◽  
pp. 45-49 ◽  
Author(s):  
Yongfeng Li ◽  
Qiang Chen ◽  
Kai Xu ◽  
Toshiro Kaneko ◽  
Rikizo Hatakeyama
Keyword(s):  
Arc Discharge ◽  
Graphene Nanosheets ◽  
Petroleum Asphalt ◽  
Pulsed Arc Discharge ◽  
Pulsed Arc

Note: Iodine dissociation with a pulsed arc discharge

2017 ◽  
Vol 88 (8) ◽  
pp. 086111
Author(s):  
H. Saghafifar ◽  
M. S. Goodarzi
Keyword(s):  
Arc Discharge ◽  
Pulsed Arc Discharge ◽  
Pulsed Arc

scholarly journals Measured Stark widths and shifts in the O IV spectrum

2003 ◽  
pp. 51-54 ◽  
Author(s):  
Stevan Djenize ◽  
Aleksandar Sreckovic ◽  
Srdjan Bukvic ◽  
Slobodanka Kalezic
Keyword(s):  
Arc Discharge ◽  
Theoretical Data ◽  
Plasma Source ◽  
Spectral Lines ◽  
Pulsed Arc Discharge ◽  
D Values ◽  
And Shifts ◽  
Pulsed Arc ◽  
Good Agreement ◽  
Thin Plasma

Stark widths (W) and shifts (d) of 5 prominent triply ionized oxygen (O IV) spectral lines in 3 multiplets have been measured in oxygen plasma at 42 000 K electron temperature using a linear, low-pressure, pulsed arc discharge as an optically thin plasma source. Obtained W and d values have been compared to available experimental and theoretical data. We found a good agreement among our experimental W and d values and theoretical expectations.

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