Role of Trimethylboron to Silane Ratio on the Properties of p-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition

2010 ◽  
Vol 10 (4) ◽  
pp. 2547-2551 ◽  
Author(s):  
H. Águas ◽  
S. A. Filonovich ◽  
I. Bernacka-Wojcik ◽  
E. Fortunato ◽  
R. Martins
Keyword(s):  
Thin Film ◽  
Radio Frequency ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Nanocrystalline Silicon ◽  
Radio Frequency Plasma ◽  
Silicon Thin Film ◽  
Frequency Plasma

Effect of pre-deposited carbon layer on the formation of carbon nitride nanostructures prepared by radio-frequency plasma enhanced chemical vapour deposition

2011 ◽  
Vol 130 (1-2) ◽  
pp. 218-222 ◽  
Author(s):  
Noor Hamizah Khanis ◽  
Richard Ritikos ◽  
Maisara Othman ◽  
Nur Maisarah Abdul Rashid ◽  
Siti Meriam Ab Gani ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Chemical Vapour Deposition ◽  
Carbon Nitride ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Carbon Layer ◽  
Radio Frequency Plasma ◽  
Frequency Plasma
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