On Analysis of Mass Transport to Formulate Conditions for Increasing Integration Rate of Elements Framework Current Comparator in Sensor Applications. An Approach to Optimize of Technological Process

2020 ◽  
Vol 18 (6) ◽  
pp. 493-509
Author(s):  
E. L. Pankratov

Framework the paper we consider an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account nonlinearity of processes. The approach gives a possibility to analyze mass and heat transport in multilayer structures without crosslinking of solutions on interfaces between layers. The approach also gives a possibility to take into account spatial and temporal variation of parameters of considered processes. Based on this approach we analyzed manufacturing a current comparator for sensor applications to increase density of elements.

Author(s):  
E. L. Pankratov

<p>We consider possibility to increase field-effect transistor's density in a switched-capacitor step-down DC-DC converter. Based on this approach we analyzed manufacturing of the converter in a heterostructure with special structure. Some specific sections of the heterostructure must be doped by ion implantation or by diffusion. After this procedure optimized annealing has been done. We also obtained conditions for decreasing of mismatch-induced stress value in this heterostructure. An analytical approach for analysis of heat and mass transport in multilayer structures has been introduced. The approach gives a possibility without crosslinking of solutionson interfaces between layers, take into account (i) spatial variation of parameters of considered processes; (ii) temporal variation of parameters of considered processes; (iii) nonlinearity of considered processes; (iv) mismatch-induced stress.</p>


2020 ◽  
Vol 12 (02) ◽  
pp. 12-32
Author(s):  
E.L. Pankratov ◽  

In this paper we introduce an approach to increase density of field-effect transistors framework an enhanced swing differential Colpitts oscillator. Framework the approach we consider manufacturing the oscillator in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that dopant and radiation defects should by annealed framework optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress


Author(s):  
E. L. Pankratov ◽  

In this paper, we introduce an approach to increase density of field-effect transistors framework a downconversion mixer circuit. Framework the approach we consider manufacturing the mixer in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that dopant and radiation defects should be annealed by framework optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress.


In this paper, we introduce an approach to increase density of field-effect transistors framework instrumentation amplifier input bias circuitry. Framework the approach, we consider the manufacturing of inverter in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. Moreover, do pant and radiation defects should by annealed framework by optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress.


2017 ◽  
Vol 45 (10) ◽  
pp. 1500471
Author(s):  
Abdelkader Ltifi ◽  
Neila Saidi ◽  
Mokded Rabhi ◽  
Kathleen S. Sealey ◽  
Amor Hafiane ◽  
...  

Author(s):  
E. L. Pankratov ◽  

In this paper, we introduce an approach to increase density of field-effect transistors framework a injection-locked frequency divider. Framework the approach, we consider manufacturing the inverter in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that dopant and radiation defects should by annealed framework optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress.


Author(s):  
E. L. Pankratov ◽  

In this paper, we introduce an approach to increase density of field-effect transistors framework an enhanced swing differential Colpitts oscillator. Framework the approach we consider manufacturing the oscillator in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that dopant and radiation defects should by annealed framework optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress.


2021 ◽  
Vol 1 (1) ◽  
pp. 10-31
Author(s):  
Evgeny L. Pankratov ◽  

In this paper we introduce an approach to increase density of field-effect transistors framework an injection-locked frequency divider. Framework the approach we consider manufacturing the inverter in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that dopant and radiation defects should by annealed framework optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress.


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