Vertically aligned carbon nanotube arrays (VACNTs) have many excellent properties and show great potential for various applications. Recently, there has been a desire to grow VACNTs on nonplanar surfaces and synthesize core-sheath-structured VACNT–inorganic hybrids. To achieve this aim, atomic layer deposition (ALD) has been extensively applied, especially due to its atomic-scale thickness controllability and excellent conformality of films on three-dimensional (3D) structures with high aspect ratios. In this paper, the ALD of catalyst thin films for the growth of VACNTs, such as Co3O4, Al2O3, and Fe2O3, was first mentioned. After that, the ALD of thin films for the synthesis of VACNT–inorganic hybrids was also discussed. To highlight the importance of these hybrids, their potential applications in supercapacitors, solar cells, fuel cells, and sensors have also been reviewed.
Atomic Layer Deposition of Buffer Layers for the Growth of Vertically Aligned Carbon Nanotube Arrays