Efficient water oxidation using α-Fe2O3 thin films conformally coated on vertically aligned titania nanotube arrays by atomic layer deposition

2015 ◽  
Vol 159 ◽  
pp. 284-288 ◽  
Author(s):  
Lifeng Liu
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Atomic Layer ◽  
Nanotube Arrays ◽  
Titania Nanotube Arrays ◽  
Layer Deposition ◽  
Titania Nanotube ◽  
Vertically Aligned

scholarly journals Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids

Coatings ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 806
Author(s):  
Guang-Jie Yuan ◽  
Jie-Fei Xie ◽  
Hao-Hao Li ◽  
Hong-Liang Lu ◽  
Ying-Zhong Tian
Keyword(s):  
Thin Films ◽  
Carbon Nanotube ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Nanotube Arrays ◽  
Aspect Ratios ◽  
Carbon Nanotube Arrays ◽  
Layer Deposition ◽  
Vertically Aligned

Vertically aligned carbon nanotube arrays (VACNTs) have many excellent properties and show great potential for various applications. Recently, there has been a desire to grow VACNTs on nonplanar surfaces and synthesize core-sheath-structured VACNT–inorganic hybrids. To achieve this aim, atomic layer deposition (ALD) has been extensively applied, especially due to its atomic-scale thickness controllability and excellent conformality of films on three-dimensional (3D) structures with high aspect ratios. In this paper, the ALD of catalyst thin films for the growth of VACNTs, such as Co3O4, Al2O3, and Fe2O3, was first mentioned. After that, the ALD of thin films for the synthesis of VACNT–inorganic hybrids was also discussed. To highlight the importance of these hybrids, their potential applications in supercapacitors, solar cells, fuel cells, and sensors have also been reviewed.

Vertically aligned TiO2/ZnO nanotube arrays prepared by atomic layer deposition for photovoltaic applications

2019 ◽  
Vol 36 (7) ◽  
pp. 1157-1163 ◽  
Author(s):  
Jae-Yup Kim ◽  
Keun-Young Shin ◽  
Muhammad Hamid Raza ◽  
Nicola Pinna ◽  
Yung-Eun Sung
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Nanotube Arrays ◽  
Zno Nanotube ◽  
Layer Deposition ◽  
Photovoltaic Applications ◽  
Vertically Aligned

Metal–Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions To Enable Electrocatalytic Water Oxidation

2015 ◽  
Vol 7 (51) ◽  
pp. 28223-28230 ◽  
Author(s):  
Chung-Wei Kung ◽  
Joseph E. Mondloch ◽  
Timothy C. Wang ◽  
Wojciech Bury ◽  
William Hoffeditz ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Metal Organic Framework ◽  
Atomic Layer ◽  
Cobalt Ions ◽  
Layer Deposition ◽  
Metal Organic ◽  
Organic Framework

Conformal Atomic Layer Deposition of Alumina on Millimeter Tall, Vertically-Aligned Carbon Nanotube Arrays

2014 ◽  
Vol 6 (21) ◽  
pp. 19135-19143 ◽  
Author(s):  
Kelly L. Stano ◽  
Murphy Carroll ◽  
Richard Padbury ◽  
Marian McCord ◽  
Jesse S. Jur ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Nanotube Arrays ◽  
Carbon Nanotube Arrays ◽  
Layer Deposition ◽  
Vertically Aligned

Depositing High-Performance Conductive Thin Films by Using Atomic Layer Deposition

2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electric Properties ◽  
X Ray Diffraction ◽  
Layer Deposition ◽  
Azo Thin Film ◽  
Aluminum Doped Zinc Oxide ◽  
Conductive Thin Films

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.

scholarly journals Fabrication of GdxFeyOz films using an atomic layer deposition-type approach

CrystEngComm ◽  
2021 ◽  
Author(s):  
Pengmei Yu ◽  
Sebastian M. J. Beer ◽  
Anjana Devi ◽  
Mariona Coll
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Complex Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Atomic Precision

The growth of complex oxide thin films with atomic precision offers bright prospects to study improved properties and novel functionalities.

Inherently Area‐Selective Atomic Layer Deposition of SiO 2 Thin Films to Confer Oxide Versus Nitride Selectivity

2021 ◽  
pp. 2102556
Author(s):  
Jinseon Lee ◽  
Jeong‐Min Lee ◽  
Hongjun Oh ◽  
Changhan Kim ◽  
Jiseong Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition
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