Reactive Pulsed DC Magnetron Sputtering and Control

2018 ◽  
pp. A5.1:1-A5.1:12 ◽  
Author(s):  
Jochen M Schneider ◽  
William D Sproul
Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang

2017 ◽  
Vol 4 (5) ◽  
pp. 6466-6471 ◽  
Author(s):  
Kittikhun Seawsakul ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Viyapol Pattantsetakul ◽  
Saksorn Limwichean ◽  
...  

2010 ◽  
Vol 207 (7) ◽  
pp. 1586-1589 ◽  
Author(s):  
K. V. Rajani ◽  
S. Daniels ◽  
P. J. McNally ◽  
F. Olabanji Lucas ◽  
M. M. Alam

Sign in / Sign up

Export Citation Format

Share Document