Effect of sputtering power on the properties of ZnO:Ga transparent conductive oxide films deposited by pulsed DC magnetron sputtering with a rotating cylindrical target
2013 ◽
Vol 271
◽
pp. 216-222
◽
2011 ◽
Vol 26
(11)
◽
pp. 115007
◽
2017 ◽
Vol 4
(5)
◽
pp. 6466-6471
◽
Keyword(s):
Keyword(s):
2005 ◽
pp. 299-302
Aluminum oxide films deposited in low pressure conditions by reactive pulsed dc magnetron sputtering
2002 ◽
Vol 20
(3)
◽
pp. 634-637
◽
Keyword(s):
Keyword(s):
2013 ◽
Vol 586
(1)
◽
pp. 168-178