Estimation of Growth Rate of Diamond-Like Carbon Films Prepared by Pulse Plasma Chemical Vapor Deposition

Journal of Solid Mechanics and Materials Engineering ◽

10.1299/jmmp.3.910 ◽

2009 ◽

Vol 3 (6) ◽

pp. 910-920 ◽

Author(s):

Shinji FUJIMOTO ◽

Naoto OHTAKE ◽

Osamu TAKAI

Keyword(s):

Growth Rate ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Structure and Mechanical Properties of Diamond-Like Carbon Films Prepared from C2H2and H2Mixtures by Pulse Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.075501 ◽

2010 ◽

Vol 49 (7) ◽

pp. 075501 ◽

Author(s):

Shinji Fujimoto ◽

Hiroki Akasaka ◽

Tsuneo Suzuki ◽

Naoto Ohtake ◽

Osamu Takai

Keyword(s):

Mechanical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Mechanical properties of silicon-doped diamond-like carbon films prepared by pulse-plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2011.03.106 ◽

2011 ◽

Vol 206 (5) ◽

pp. 1011-1015 ◽

Author(s):

Shinji Fujimoto ◽

Naoto Ohtake ◽

Osamu Takai

Keyword(s):

Mechanical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Mechanism of high growth rate for diamond-like carbon films synthesized by helicon wave plasma chemical vapor deposition

Plasma Science and Technology ◽

10.1088/2058-6272/aa94bd ◽

2018 ◽

Vol 20 (2) ◽

pp. 025505 ◽

Author(s):

Peiyu JI ◽

Jun YU ◽

Tianyuan HUANG ◽

Chenggang JIN ◽

Yan YANG ◽

...

Keyword(s):

Growth Rate ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Growth ◽

Carbon Films ◽

High Growth Rate ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2996273 ◽

2008 ◽

Vol 93 (13) ◽

pp. 131920 ◽

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Synthesis of Diamond-Like Carbon Films Using Hot Filament-Aided Microwave Plasma Chemical Vapor Deposition

Plasma Science and Technology ◽

10.1088/1009-0630/3/6/005 ◽

2001 ◽

Vol 3 (6) ◽

pp. 1043-1048

Author(s):

Huang Wei-dong ◽

Wu Cong-feng ◽

Zhan Ru-juan

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Synthesis of Diamond-like Carbon Films by Nanopulse Plasma Chemical Vapor Deposition in Open Air

Journal of the Japan Society for Precision Engineering Contributed Papers ◽

10.2493/jspe.72.1237 ◽

2006 ◽

Vol 72 (10) ◽

pp. 1237-1241

Author(s):

Yoshimasa KONDO ◽

Takao SAITO ◽

Masanori SAITO ◽

Tatsuya TERAZAWA ◽

Naoto OHTAKE

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Synthesis of Diamond-like Carbon Films by Nanopulse Plasma Chemical Vapor Deposition at Subatmospheric Pressure

Journal of the Japan Society for Precision Engineering Contributed Papers ◽

10.2493/jspe.71.1548 ◽

2005 ◽

Vol 71 (12) ◽

pp. 1548-1552 ◽

Author(s):

Yoshimasa KONDO ◽

Masanori SAITO ◽

Takao SAITO ◽

Naoto OHTAKE

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Subatmospheric Pressure ◽

Plasma Chemical Vapor Deposition

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The properties of N-doped diamond-like carbon films prepared by helicon wave plasma chemical vapor deposition

Plasma Science and Technology ◽

10.1088/2058-6272/aaee90 ◽

2018 ◽

Vol 21 (2) ◽

pp. 025502

Author(s):

Jiali CHEN ◽

Peiyu JI ◽

Chenggang JIN ◽

Lanjian ZHUGE ◽

Xuemei WU

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helicon Wave ◽

Helicon Wave Plasma

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High density plasma chemical vapor deposition of diamond-like carbon films

Microelectronics Journal ◽

10.1016/s0026-2692(03)00065-x ◽

2003 ◽

Vol 34 (5-8) ◽

pp. 627-629 ◽

Author(s):

A.P. Mousinho ◽

R.D. Mansano ◽

M. Massi ◽

L.S. Zambom

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

High Density ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Surface relaxation during plasma chemical vapor deposition of diamond-like carbon films, investigated by in-situ ellipsometry

Thin Solid Films ◽

10.1016/s0040-6090(97)00423-9 ◽

1997 ◽

Vol 308-309 ◽

pp. 195-198 ◽

Author(s):

A von Keudell ◽

T Schwarz-Selinger ◽

W Jacob

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Surface Relaxation ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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