scholarly journals Diagnostics of etching plasmas

2002 ◽  
Vol 74 (3) ◽  
pp. 397-400 ◽  
Author(s):  
Jean-Paul Booth

Radio-frequency excited, low-pressure plasmas in halogen-containing gases are widely used to etch submicronic features in a range of materials during integrated circuit manufacture. Costly process-drift problems are often caused by the ubiquitous deposition of polymer layers on the reactor walls. Simple and robust sensors of the reactor performance are needed to monitor and manage these effects. This paper presents results obtained in industrial plasma-etching machines using a deposition-tolerant ion flux probe and broadband UV­vis absorption spectroscopy.

1997 ◽  
Vol 7 (4) ◽  
pp. 937-950
Author(s):  
I. Grenier ◽  
V. Massereau ◽  
A. Celerier ◽  
J. Machet

Author(s):  
Amy Poe ◽  
Steve Brockett ◽  
Tony Rubalcava

Abstract The intent of this work is to demonstrate the importance of charged device model (CDM) ESD testing and characterization by presenting a case study of a situation in which CDM testing proved invaluable in establishing the reliability of a GaAs radio frequency integrated circuit (RFIC). The problem originated when a sample of passing devices was retested to the final production test. Nine of the 200 sampled devices failed the retest, thus placing the reliability of all of the devices in question. The subsequent failure analysis indicated that the devices failed due to a short on one of two capacitors, bringing into question the reliability of the dielectric. Previous ESD characterization of the part had shown that a certain resistor was likely to fail at thresholds well below the level at which any capacitors were damaged. This paper will discuss the failure analysis techniques which were used and the testing performed to verify the failures were actually due to ESD, and not caused by weak capacitors.


Author(s):  
D. Tamilarasi ◽  
P. Ramesh ◽  
Raja Krishnamoorthy ◽  
C. Bharatiraja ◽  
T. Jayasankar

Author(s):  
Hong-xin Zhang ◽  
Jia Liu ◽  
Jun Xu ◽  
Fan Zhang ◽  
Xiao-tong Cui ◽  
...  

Abstract The electromagnetic radiation of electronic equipment carries information and can cause information leakage, which poses a serious threat to the security system; especially the information leakage caused by encryption or other important equipment will have more serious consequences. In the past decade or so, the attack technology and means for the physical layer have developed rapidly. And system designers have no effective method for this situation to eliminate or defend against threats with an absolute level of security. In recent years, device identification has been developed and improved as a physical-level technology to improve the security of integrated circuit (IC)-based multifactor authentication systems. Device identification tasks (including device identification and verification) are accomplished by monitoring and exploiting the characteristics of the IC’s unintentional electromagnetic radiation, without requiring any modification and process to hardware devices, thereby providing versatility and adapting existing hardware devices. Device identification based on deep residual networks and radio frequency is a technology applicable to the physical layer, which can improve the security of integrated circuit (IC)-based multifactor authentication systems. Device identification tasks (identification and verification) are accomplished by passively monitoring and utilizing the inherent properties of IC unintended RF transmissions without requiring any modifications to the analysis equipment. After the device performs a series of operations, the device is classified and identified using a deep residual neural network. The gradient descent method is used to adjust the network parameters, the batch training method is used to speed up the parameter tuning speed, the parameter regularization is used to improve the generalization, and finally, the Softmax classifier is used for classification. In the end, 28 chips of 4 models can be accurately identified into 4 categories, then the individual chips in each category can be identified, and finally 28 chips can be accurately identified, and the verification accuracy reached 100%. Therefore, the identification of radio frequency equipment based on deep residual network is very suitable as a countermeasure for implementing the device cloning technology and is expected to be related to various security issues.


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