Comparative study of titanium dioxide thin films produced by electron-beam evaporation and by reactive low-voltage ion plating

1993 ◽  
Vol 32 (28) ◽  
pp. 5594 ◽  
Author(s):  
K. Balasubramanian ◽  
X. F. Han ◽  
K. H. Guenther
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Electron Beam ◽  
Comparative Study ◽  
Low Voltage ◽  
Electron Beam Evaporation ◽  
Ion Plating ◽  
Titanium Dioxide Thin Films

Comparative study of ZnO thin films prepared by plasma deposition and electron beam evaporation for use in photovoltaic devices

2010 ◽  
Vol 19 (2) ◽  
pp. 149-154 ◽  
Author(s):  
V. D. Falcão ◽  
D. O. Miranda ◽  
M. E. L. Sabino ◽  
T. D. O. Moura ◽  
A. S. A. C Diniz ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Comparative Study ◽  
Plasma Deposition ◽  
Electron Beam Evaporation ◽  
Zno Thin Films ◽  
Photovoltaic Devices

Mesoporous Titanium Dioxide Thin Films on Quartz via Electrochemical Anodisation Process

2015 ◽  
Vol 1119 ◽  
pp. 456-460
Author(s):  
Sureeporn Uttiya ◽  
Ornella Cavalleri ◽  
Michele Biasotti ◽  
Marcella Pani ◽  
Maria Maddalena Carnasciali ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Electron Beam Evaporation ◽  
Metallic Titanium ◽  
High Quality ◽  
Afm Analysis ◽  
Titanium Dioxide Thin Films ◽  
Quartz Substrates ◽  
Anodisation Process ◽  
Ti Films

Titanium dioxide (TiO2) thin films were prepared by means of electrochemical anodisation or anodic spark deposition (ASD) from thin and flat metallic titanium (Ti) films pre-deposited on high quality quartz substrates by electron beam evaporation. AFM analysis indicates the formation of uniform mesoporous layers and a definite increase about 50% of the film thickness upon anodisation and about 90% upon annealing. Anodised mesoporous TiO2films have been characterized by Raman spectroscopy, which indicates the presence of well-defined peaks related to anatase structure. Phase transformation from anatase to rutile was observed after annealing at temperatures up to 900°C for 3h.

Optical constants of DC magnetron sputtered titanium dioxide thin films measured by spectroscopic ellipsometry

2003 ◽  
Vol 38 (9) ◽  
pp. 773-778 ◽  
Author(s):  
B. Karunagaran ◽  
R. T. Rajendra Kumar ◽  
C. Viswanathan ◽  
D. Mangalaraj ◽  
Sa. K. Narayandass ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Spectroscopic Ellipsometry ◽  
Optical Constants ◽  
Titanium Dioxide Thin Films

AlN thin films fabricated by ultra-high vacuum electron-beam evaporation with ammonia for silicon-on-insulator application

2005 ◽  
Vol 239 (3-4) ◽  
pp. 327-334 ◽  
Author(s):  
Ming Zhu ◽  
Peng Chen ◽  
Ricky K.Y. Fu ◽  
Weili Liu ◽  
Chenglu Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
High Vacuum ◽  
Electron Beam Evaporation ◽  
Silicon On Insulator ◽  
Ultra High Vacuum
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