Characterization by guided wave of instabilities of optical coatings submitted to high-power flux: thermal and third-order nonlinear properties of dielectric thin films

1993 ◽  
Vol 32 (28) ◽  
pp. 5628 ◽  
Author(s):  
François Flory ◽  
Hervé Rigneault ◽  
Nopparat Maythaveekulchai ◽  
Frédéric Zamkotsian
Optik ◽  
2019 ◽  
Vol 181 ◽  
pp. 146-155 ◽  
Author(s):  
H. Algarni ◽  
A.E. Al-Salami ◽  
A.A. Alshahrani ◽  
T.F. Alhuwaymel ◽  
A. Al-Mogeeth

2018 ◽  
Vol 2018 ◽  
pp. 1-9
Author(s):  
Liangmin Zhang

Optical conduction resonance- (OCR-) enhanced third-order optical nonlinearity of two dimensional (2D) periodic gold nanoparticle array-dielectric thin films has been investigated. The third-order optical susceptibility of periodic gold nanoparticle array embedded in silica thin film shows ~104 enhancement comparing to gold nanoparticle colloids. The 2D gold nanoparticle arrays were synthesized by using the electrostatic self-assembly (ESA) technique. During the fabrication process, the positively or negatively functionalized gold nanoparticles are automatically self-aligned to establish a 2D array with a very small interparticle spacing due to the polymer shell on the metal particles. Then, a monolayer of silica can be coated on the top of the 2D metal nanoparticle array. This type of 2D gold nanoparticle array-dielectric thin films has high volume fraction of gold nanoparticles. According to the extended Maxwell-Garnett theory, this kind of films can exhibit OCR. The OCR frequency can be tuned from visible to mid-infrared by controlling the gold nanoparticle volume fraction. During OCR, the real part of the composite dielectric constant is zero to make the induced electromagnetic waves in gold nanoparticles to couple effectively within the film. The open-aperture z-scan technique is used to measure the nonlinear optical properties of the ESA films.


2017 ◽  
Vol 696 ◽  
pp. 321-328 ◽  
Author(s):  
Congfei Yin ◽  
Weibin Fan ◽  
Weidong Xiang ◽  
Guangcai Hu ◽  
Xie Hu ◽  
...  

2018 ◽  
Author(s):  
K. A. Rubin ◽  
W. Jolley ◽  
Y. Yang

Abstract Scanning Microwave Impedance Microscopy (sMIM) can be used to characterize dielectric thin films and to quantitatively discern film thickness differences. FEM modeling of the sMIM response provides understanding of how to connect the measured sMIM signals to the underlying properties of the dielectric film and its substrate. Modeling shows that sMIM can be used to characterize a range of dielectric film thicknesses spanning both low-k and medium-k dielectric constants. A model system consisting of SiO2 thin films of various thickness on silicon substrates is used to illustrate the technique experimentally.


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