scholarly journals Nonlinear dielectric thin films for high-power electric storage with energy density comparable with electrochemical supercapacitors

2011 ◽  
Vol 58 (9) ◽  
pp. 1968-1974 ◽  
Author(s):  
Kui Yao ◽  
Shuting Chen ◽  
M. Rahimabady ◽  
M. S. Mirshekarloo ◽  
Shuhui Yu ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Density ◽  
High Power ◽  
Electrochemical Supercapacitors ◽  
Dielectric Thin Films ◽  
Nonlinear Dielectric

Tunable microwave mixing in nonlinear dielectric thin films of SrTiO3 and Sr0.5Ba0.5TiO3

1995 ◽  
Vol 31 (21) ◽  
pp. 1814-1815 ◽  
Author(s):  
A.T. Findikoglu ◽  
D.W. Reagor ◽  
Q.X. Jia ◽  
X.D. Wu
Keyword(s):  
Thin Films ◽  
Dielectric Thin Films ◽  
Nonlinear Dielectric ◽  
Tunable Microwave

Novel BiAlO3 dielectric thin films with high energy density

2019 ◽  
Vol 45 (17) ◽  
pp. 22523-22527 ◽  
Author(s):  
Zongxin Li ◽  
Hanxing Liu ◽  
Zhonghua Yao ◽  
Juan Xie ◽  
Xixi Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Density ◽  
High Energy ◽  
High Energy Density ◽  
Dielectric Thin Films

Method for measuring polarity-inverted layered structure in dielectric thin films using scanning nonlinear dielectric microscopy

2016 ◽  
Vol 498 (1) ◽  
pp. 47-51 ◽  
Author(s):  
Hiroyuki Odagawa ◽  
Koshiro Terada ◽  
Hiroaki Nishikawa ◽  
Takahiko Yanagitani ◽  
Yasuo Cho
Keyword(s):  
Thin Films ◽  
Layered Structure ◽  
Dielectric Thin Films ◽  
Nonlinear Dielectric

Finite-Element Modeling and Quantitative Measurement Using Scanning Microwave Microscopy to Characterize Dielectric Films

2018 ◽  
Author(s):  
K. A. Rubin ◽  
W. Jolley ◽  
Y. Yang
Keyword(s):  
Thin Films ◽  
Dielectric Film ◽  
Dielectric Constants ◽  
Dielectric Films ◽  
Silicon Substrates ◽  
Fem Modeling ◽  
Dielectric Thin Films ◽  
Microwave Microscopy ◽  
Scanning Microwave Microscopy ◽  
Low K

Abstract Scanning Microwave Impedance Microscopy (sMIM) can be used to characterize dielectric thin films and to quantitatively discern film thickness differences. FEM modeling of the sMIM response provides understanding of how to connect the measured sMIM signals to the underlying properties of the dielectric film and its substrate. Modeling shows that sMIM can be used to characterize a range of dielectric film thicknesses spanning both low-k and medium-k dielectric constants. A model system consisting of SiO2 thin films of various thickness on silicon substrates is used to illustrate the technique experimentally.

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