Rugate filters fabricated by a radio frequency magnetron sputtering system by use of an optical in situ monitoring technique

2006 ◽  
Vol 45 (1) ◽  
pp. 184 ◽  
Author(s):  
Hidehiko Yoda ◽  
Daisaku Tanaka ◽  
Osamu Hanaizumi ◽  
Yoshinori Kogami ◽  
Kazuo Shiraishi
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
In Situ Monitoring ◽  
Radio Frequency Magnetron Sputtering ◽  
Monitoring Technique ◽  
Sputtering System

scholarly journals In-situ x-ray studies of compositional control during synthesis of LaGaO3 by radio frequency-magnetron sputtering

2015 ◽  
Vol 107 (8) ◽  
pp. 081606 ◽  
Author(s):  
Matthew J. Highland ◽  
Dillon D. Fong ◽  
Guangxu Ju ◽  
Carol Thompson ◽  
Peter M. Baldo ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray ◽  
Compositional Control

scholarly journals Barrier thickness dependence of MgxZn1−xO/ZnO quantum well (QW) on the performance of a p-NiO/QW/n-ZnO photodiode

RSC Advances ◽  
2019 ◽  
Vol 9 (51) ◽  
pp. 29967-29972
Author(s):  
Jun Dar Hwang ◽  
Jhong Yung Jiang
Keyword(s):  
Quantum Well ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
Thickness Dependence ◽  
Radio Frequency Magnetron Sputtering ◽  
Barrier Thickness ◽  
System P ◽  
Sputtering System

An MgxZn1−xO/ZnO quantum well (QW) structure, with various barrier (MgxZn1−xO layer) thicknesses, was inserted into p-NiO/n-ZnO heterojunction photodiodes (HPDs) by using a radio-frequency magnetron sputtering system.

The Atomic Force Microscope Study of Self-Assembled Silicon Nanodots Growth Using Magnetron Sputtering System

2013 ◽  
Vol 795 ◽  
pp. 721-725 ◽  
Author(s):  
Fatima Aldaw Idrees ◽  
Samsudi Sakrani ◽  
Zulkafli Othaman
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
Experimental Conditions ◽  
Growth Technique ◽  
Atomic Force ◽  
Self Assembled ◽  
Temperature Time ◽  
Sputtering System

In this paper self-assembled silicon nanodots have been grown on silicon substrate using radio-frequency magnetron sputtering system. This system were settled at varying experimental conditions such as substrate temperature, time of deposition, RF power and fixed argon flow rate. Then the surface roughness was measured by AFM which resulted average dots size of 113 nm. However, the presence of a small amount of grain atoms formed on the surface was confirmed using SEM measurement. The crystalline Si-NDs with (100) plane contributed sharp diffraction peak located at 69.5° was confirmed using XRD measurement. These results of Si-NDs structural properties support the possible growth technique of radio-frequency magnetron sputtering.

Characterization of the plasma in a radio-frequency magnetron sputtering system

2004 ◽  
Vol 95 (12) ◽  
pp. 7611-7618 ◽  
Author(s):  
A. Palmero ◽  
E. D. van Hattum ◽  
W. M. Arnoldbik ◽  
A. M. Vredenberg ◽  
F. H. P. M. Habraken
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
Sputtering System
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