Polarization-Modulation Emission FT-IR Measurement of Thin Organic Films on Metal Surfaces

1992 ◽  
Vol 46 (1) ◽  
pp. 156-158 ◽  
Author(s):  
Kenji Tochigi ◽  
Hideto Momose ◽  
Yutaka Misawa ◽  
Takaya Suzuki

A polarization-modulation technique has been combined with Fourier transform infrared (FT-IR) spectrometry to eliminate the large background radiation which interferes with the infrared emission from thin organic films on metal surfaces. A step scan and a continuous scan interferometer which were combined with a photoelastic modulator were also studied, and the step scan system was found to be stabler and have a better S/N. The spectrum of a 12-nm perfluoropolyether film was obtained at 120°C by this system.

1986 ◽  
Vol 40 (4) ◽  
pp. 498-503 ◽  
Author(s):  
R. T. Graf ◽  
F. Eng ◽  
J. L. Koenig ◽  
H. Ishida

Polarization modulation infrared ellipsometric spectra were collected on an FT-IR spectrometer, with the use of two linear polarizers and a photoelastic modulator. Samples consisted of thin poly(vinyl acetate) and poly(methyl methacrylate) films on gold substrates. The relative phase retardation (delta) and relative amplitude (psi) were derived from these measurements. These spectra were superior to those from static infrared ellipsometry measurements on the same samples. The thickness and optical constants of the films were calculated from the ellipsometric measurements and compared with reference optical constant spectra.


1986 ◽  
Vol 324 (6) ◽  
pp. 571-578 ◽  
Author(s):  
Peter R. Griffiths ◽  
Kenneth W. Van Every ◽  
Norman A. Wright

1988 ◽  
Vol 31 (1) ◽  
pp. 42-58 ◽  
Author(s):  
F.J. Boerio ◽  
J.P. Boerio ◽  
R.C. Bozian

1995 ◽  
Vol 189 (Part_2) ◽  
pp. 276-276
Author(s):  
H.-D. Dörfler

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