Polarization-Modulation Emission FT-IR Measurement of Thin Organic Films on Metal Surfaces
Keyword(s):
Ft Ir
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A polarization-modulation technique has been combined with Fourier transform infrared (FT-IR) spectrometry to eliminate the large background radiation which interferes with the infrared emission from thin organic films on metal surfaces. A step scan and a continuous scan interferometer which were combined with a photoelastic modulator were also studied, and the step scan system was found to be stabler and have a better S/N. The spectrum of a 12-nm perfluoropolyether film was obtained at 120°C by this system.
1986 ◽
Vol 324
(6)
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pp. 571-578
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Keyword(s):
1981 ◽
Vol 7
(3)
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pp. 281-285
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Keyword(s):
1988 ◽
Vol 31
(1)
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pp. 42-58
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1995 ◽
Vol 189
(Part_2)
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pp. 276-276
1996 ◽
Vol 115
(1-4)
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pp. 246-250
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