scholarly journals Using Solubility Parameter for Selection of Solvents for Thermo-Processed Polymer Positive Photoresist Masks Applied in “Lift-Off” Photolithography

2017 ◽  
Vol 9 (3) ◽  
pp. 26-36
Author(s):  
D Lysich ◽  
◽  
Keyword(s):  
Solubility Parameter ◽  
Positive Photoresist ◽  
Lift Off ◽  
Selection Of

CMOS Compatible Integrated PZT Capacitors

1997 ◽  
Vol 493 ◽  
Author(s):  
Joe T. Evans ◽  
Leonard L. Boyer ◽  
Robert I. Suizu ◽  
Geri Velasquez
Keyword(s):  
Standard Deviation ◽  
Nonvolatile Memory ◽  
Negative Impact ◽  
Hysteresis Loops ◽  
Statistical Testing ◽  
Interlayer Dielectric ◽  
Defect Rate ◽  
Lift Off ◽  
Ferroelectric Capacitors ◽  
Selection Of

ABSTRACTThe fabrication of high yielding ferroelectric capacitors on CMOS wafers is difficult due to the negative impact of post-capacitor process steps, especially the interlayer dielectric and the metal interconnect sinter. Proper selection of the process for each layer of the capacitor structure is necessary to minimize hysteresis damage to the ferroelectric capacitors during their construction. The authors fabricated integrated PZT capacitors on blank silicon wafers using lift off processes for the bottom and top electrodes and a combination titanium dioxide/silicon dioxide dielectric between the ferroelectric capacitors and the metal interconnect layer. A 15 minute nitrogen anneal at 450 degrees centigrade after the metal interconnect patterning did not damage the capacitor hysteresis loops. Statistical testing of over 700 capacitors for shorts indicated a defect rate of 127 defects per square centimeter. This is sufficiently low enough to generate 50% yield in a production 64Kbit double-sided-sense nonvolatile memory. At 3.5V, the capacitors generated 14.0 microcoulombs per square centimeter with a standard deviation of 2.3 microcoulombs per square centimeter. The authors have set a target for future lots of 20 defects per square centimeter with 32 microcoulombs per square centimeter at 2.0V with a standard deviation of 1.6 microcoulombs per square centimeter.

A Method to Fabricate Thin Micro Silicon Cantilever Based on Optical Lithography with AZ 1518

2015 ◽  
Vol 645-646 ◽  
pp. 1093-1098
Author(s):  
Chen Zhi Tang
Keyword(s):  
Exposure Time ◽  
Optical Lithography ◽  
Electromechanical Systems ◽  
Research Results ◽  
Positive Photoresist ◽  
Silicon Cantilever ◽  
Photolithography Process ◽  
Inclined Planes ◽  
Selection Of

AZ 1518 is a standard thin positive photoresist in AZ1500series which has been widely used in photolithography process, beside this, as a perfect semiconductor material, micro sized silicon cantilevers have been widely used in micro electromechanical systems (MEMS). In This paper, we have presented the process of fabricate micro silicon cantilever, including the selection of the photoresist, developer and substrate, optical lithography method and PLD method. After these, AFM is used to study the cantilever pattern and the angle of inclined planes. The research results show the exposure time and experimental environment can significantly influent the quality of cantilever pattern.

Fabrication of Fine-Line Pattern with Image Reversal Process

2011 ◽  
Vol 411 ◽  
pp. 474-477 ◽  
Author(s):  
Shuai Bao ◽  
Ai Hua Gao ◽  
Huan Liu ◽  
Wei Guo Liu
Keyword(s):  
Single Layer ◽  
Line Pattern ◽  
Positive Photoresist ◽  
Saw Devices ◽  
Reversal Process ◽  
Flood Exposure ◽  
Photoresist Film ◽  
Electrode Fabrication ◽  
Lift Off ◽  
Image Reversal

This paper describes a simple and effective lift-off method that relies upon a single layer of positive photoresist and lithography technology. We have succeeded in patterning narrow lines in a photoresist film by image reversal process. Image reversal with AZ 5214-E resist is characterized by contact lithography. A process of patterning different line widths was developed based on image reversal technology, using AZ5214-E, followed by pre-bake, exposure, reversal bake, flood exposure and development. We could obtain very neat patterns with 2-5μm dimensions and their relative features have been supported by scanning electron microscope (SEM) pictures. The application of the proposed process is suitable for the electrode fabrication in MEMS SAW devices.

scholarly journals Ferromagnetic polymer dispersions based on methacrylic esters. The influence of composition solubility parameter on the regularities of obtaining

2020 ◽  
Vol 3 (2) ◽  
pp. 157-162
Author(s):  
N. B. Semenyuk ◽  
◽  
T. V. Skorokhoda ◽  
G. D. Dudok ◽  
◽  
...  
Keyword(s):  
Comparative Studies ◽  
Solubility Parameter ◽  
Glycidyl Methacrylate ◽  
Dispersion Medium ◽  
Hydroxyethyl Methacrylate ◽  
Dispersion Characteristics ◽  
Polymer Particles ◽  
Effective Dispersion ◽  
Polymer Dispersions ◽  
Selection Of

The influence of the solubility parameter on the regularities of obtaining polymer dispersions based on copolymers of 2-hydroxyethyl methacrylate and glycidyl methacrylate are investigated. A method of nucleating polymerization for obtaining micron-sized monodispersed spherical materials is proposed. The influence of the nature and amount of solvent on the dispersion characteristics of the polymer particles has been established. The selection of an effective dispersion medium for the polymerization of НЕMА and GMA was made. Comparative studies of the polymerization of monomers of different hydrophilicity and solubility have shown that the size and dispersion of the particles are greatly influenced by the hydrophobicity of the monomer.

A simple and effective lift-off with positive photoresist

2005 ◽  
Vol 15 (11) ◽  
pp. 2136-2140 ◽  
Author(s):  
Hyung Suk Lee ◽  
Jun-Bo Yoon
Keyword(s):  
Positive Photoresist ◽  
Lift Off

scholarly journals ВИЗНАЧЕННЯ ПОТРІБНОГО ПИТОМОГО НАВАНТА-ЖЕННЯ НА КРИЛО РАКЕТИ

2021 ◽  
pp. 143-149
Author(s):  
O. А. Tsyriuk ◽  
А. А. Tsaritsynskyi
Keyword(s):  
Mass Fraction ◽  
Total Mass ◽  
Flight Performance ◽  
Wing Loading ◽  
Acceptable Range ◽  
Lift Off ◽  
The Moment ◽  
Minimal Mass ◽  
Cruise Flight ◽  
Selection Of

Wing loading severely affects the mass of a missile as well as its flight performance. For airplanes this parameter must not exceed allowable values calculated from different requirements especially related to such cases as lift-off, landing, cruise flight and aircraft maneuverability. For missiles wing loading is determined considering launch conditions and providing the necessary maneuverability. Appropriate estimation of wing loading at the initial design stages guarantees the minimal mass of an aircraft with all tactical requirements met.Review of available literature, related to missile design, has shown that the problem of optimal wing loading estimation contains lengthy and quite approximate analytical expressions.This article is dedicated to the development of a missile wing loading estimation technique that provides minimal propellant mass fraction and total mass of an aircraft while meeting tactical requirements.Impact of wing loading onto propellant mass fraction, maximal maneuverability and total mass of a missile is considered. The algorithm of optimal wing loading estimation, which provides necessary tactical characteristics of a missile being designed, is proposed. We define simple polynomial approximations of both the trajectory and the velocity profile. Further analysis is being conducted using two considerations: for an air-based missile the value of wing loading has to provide flight during launch without fall movement as well as the maximal maneuverability at the moment when a missile intercepts the target.It is shown that for the wing loading in the range from 300 to 1000 kg/m2 the propellant mass fraction changes rapidly, and inaccurate selection of wing loading may lead to obtaining of an incorrect value of propellant mass fraction. For maximal maneuverability less than 40, inappropriate selection of wing loading may cause significant numerical error. Analysis of relation between wing loading and total mass of a missile revealed that there is a critical value of wing loading which depends on initial data and represents the low limit of an acceptable range.

scholarly journals Chemical Lift-Off Process Using Acetone Ink for Easy Fabrication of Metallic Nano/Microstructures

2020 ◽  
Vol 14 (2) ◽  
pp. 229-237
Author(s):  
Potejana Potejanasak ◽  
Truong Duc Phuc ◽  
Motoki Terano ◽  
Takatoki Yamamoto ◽  
Masahiko Yoshino ◽  
...  
Keyword(s):  
Surface Energy ◽  
Organic Solvent ◽  
Metal Film ◽  
Metal Films ◽  
Film Deposition ◽  
Space Structures ◽  
Coated Metal ◽  
Mold Fabrication ◽  
Lift Off ◽  
Selection Of

In this paper, a chemical lift-off process using acetone ink was examined to attain the easy fabrication of metallic nano/microstructures. This process consists of five steps: cleaning of the substrate, chemical stamping, metal film deposition, coating with glue, and selective peeling. Details of the hot embossing process for the cycloolefin polymer (COP) film mold fabrication and the selection of the organic solvent ink for the chemical stamping are also explained. The fabrication of several kinds of metallic nano/microstructures, such as Au line and space structures, Au square film arrays, and Au dot arrays, is demonstrated. It is shown that metal films coated on the stamped region peeled off with the glue, and a metal film shaped in the stamp’s negative pattern remained on the substrate. Acetone is effective for reducing the surface energy of the substrate and the bonding strength, resulting in selective peeling of the coated metal film.

Cognitive gadgets and cognitive priors

2019 ◽  
Vol 42 ◽  
Author(s):  
Gian Domenico Iannetti ◽  
Giorgio Vallortigara
Keyword(s):  
Cognitive Neuroscience ◽  
Selection Of

Abstract Some of the foundations of Heyes’ radical reasoning seem to be based on a fractional selection of available evidence. Using an ethological perspective, we argue against Heyes’ rapid dismissal of innate cognitive instincts. Heyes’ use of fMRI studies of literacy to claim that culture assembles pieces of mental technology seems an example of incorrect reverse inferences and overlap theories pervasive in cognitive neuroscience.

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