Influence of Surface Modification on Properties of Stainless Steel Used for Implants / Wpływ Modyfikacji Powierzchni Na Właściwości Stali Nierdzewnej Stosowanej Na Implanty

The aim of the study was assessment of the influence of stainless steel 316 LVM surface modification on its functional properties. The analyzed steel undergone a surface treatment consisting of the following processes: mechanical polishing, chemical passivation and deposition of Al2O3 layers by Atomic Layer Deposition method. The proposed variant of surface treatment will undoubtedly contribute to improving the functional properties of stainless steel intended for implants. In order to assess functional properties of the steel, electrochemical studies, adhesion (scratch test), wetting angle tests and topography of surface (AFM method) were performed. The obtained results of the study showed clearly that the proposed by the authors way of surface treatment including: mechanical polishing, chemical passivation and deposition of Al2O3 layer by means of the ALD method effectively improves the corrosion resistance of stainless steel.

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Surface Modification of Carbon Post Arrays by Atomic Layer Deposition of ZnO Film

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2011.4827 ◽

2011 ◽

Vol 11 (8) ◽

pp. 7322-7326 ◽

Cited By ~ 2

Author(s):

Hyun Ae Lee ◽

Young-Chul Byun ◽

Umesh Singh ◽

Hyoung J. Cho ◽

Hyoungsub Kim

Keyword(s):

Surface Modification ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Zno Film ◽

Layer Deposition

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Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel

Applied Catalysis B Environmental ◽

10.1016/j.apcatb.2011.03.010 ◽

2011 ◽

Vol 104 (1-2) ◽

pp. 6-11 ◽

Cited By ~ 25

Author(s):

Hyemin Kang ◽

Chang-Soo Lee ◽

Do-Young Kim ◽

Jungwon Kim ◽

Wonyong Choi ◽

...

Keyword(s):

Stainless Steel ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Photocatalytic Effect ◽

Layer Deposition

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Atomic layer deposition-triggered hierarchical core/shell stable bifunctional electrocatalysts for overall water splitting

Journal of Materials Chemistry A ◽

10.1039/d1ta06566a ◽

2021 ◽

Vol 9 (37) ◽

pp. 21132-21141

Author(s):

T. Kavinkumar ◽

Selvaraj Seenivasan ◽

Hyeonjung Jung ◽

Jeong Woo Han ◽

Do-Heyoung Kim

Keyword(s):

Surface Modification ◽

Atomic Layer Deposition ◽

Water Splitting ◽

Atomic Layer ◽

Core Shell ◽

Interface Engineering ◽

Bifunctional Electrocatalyst ◽

Overall Water Splitting ◽

Bifunctional Electrocatalysts ◽

Layer Deposition

A synergistic strategy of interface engineering and surface modification is efficient to construct a promising bifunctional electrocatalyst for enhanced electrocatalytic water splitting.

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Atomic Layer Deposition of Lithium-Silicon-Tin Oxide Nanofilms for High Performance Thin Film Batteries Anodes

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.299.1058 ◽

2020 ◽

Vol 299 ◽

pp. 1058-1063

Author(s):

Denis Nazarov ◽

Ilya Mitrofanov ◽

Maxim Yu. Maximov

Keyword(s):

Thin Film ◽

Stainless Steel ◽

Atomic Layer Deposition ◽

Tin Oxide ◽

Oxygen Plasma ◽

Atomic Layer ◽

Cycling Performance ◽

Spectral Ellipsometry ◽

X Ray ◽

Layer Deposition

Tin oxide is the most promising material for thin film anodes of Li-ion batteries due to its cycling performance and high theoretical capacity. It is assumed that lithium-tin oxide can demonstrate even higher performance. Lithium-silicon-tin oxide nanofilms were prepared by atomic layer deposition (ALD), using the lithium bis (trimethylsilyl) amide (LiHMDS), tetraethyltin (TET) as a metal containing reagents and ozone or water or oxygen plasma as counter-reactants. Monocrystalline silicon (100) and stainless steel (316SS) were used as supports. The thicknesses of the nanofilms were measured by spectral ellipsometry (SE) and scanning electron microscopy (SEM). It was found that oxygen plasma is the most optimal ALD counter-reactant. The composition and structure were studied by Time-of-Flight Secondary Ion Mass Spectroscopy (ToF-SIMS), X-ray Photoelectron Spectroscopy (XPS) and X-ray diffraction (XRD). The nanofilms contain silicon as impurity, whose source is the ALD precursor (LiHMDS). The nanofilms deposited on stainless steel have shown the high Coulombic efficiency (99.1-99.8%) and cycling performance at a relatively high voltage (0.01 to 2.0V).

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Improving Powder Characteristics by Surface Modification Using Atomic Layer Deposition

Organic Process Research & Development ◽

10.1021/acs.oprd.9b00247 ◽

2019 ◽

Vol 23 (11) ◽

pp. 2362-2368 ◽

Cited By ~ 2

Author(s):

Cosima Hirschberg ◽

Nikolaj Sølvkær Jensen ◽

Johan Boetker ◽

Anders Østergaard Madsen ◽

Tommi O. Kääriäinen ◽

...

Keyword(s):

Surface Modification ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

Powder Characteristics

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Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

Materials Advances ◽

10.1039/d0ma00666a ◽

2021 ◽

Author(s):

Jerome W. F. Innocent ◽

Mari Napari ◽

Andrew L. Johnson ◽

Thom R. Harris-Lee ◽

Miriam Regue ◽

...

Keyword(s):

Surface Modification ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Atomic Scale ◽

Layer Deposition ◽

Scale Surface

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor.

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