Ablation Process of Silica Glass Induced by Laser Plasma Soft X-ray Irradiation

2009 ◽  
Vol 129 (4) ◽  
pp. 595-600
Author(s):  
Tetsuya Makimura ◽  
Takashige Fujimori ◽  
Shuichi Torii ◽  
Hiroyuki Niino ◽  
Kouichi Murakami
Keyword(s):  
Laser Plasma ◽  
Silica Glass ◽  
Ablation Process ◽  
X Ray

Ablation process of silica glass induced by laser plasma soft X-ray irradiation

2009 ◽  
Vol 255 (24) ◽  
pp. 9840-9842 ◽  
Author(s):  
Shuichi Torii ◽  
Takashige Fujimori ◽  
Tetsuya Makimura ◽  
Hiroyuki Niino ◽  
Kouichi Murakami
Keyword(s):  
Laser Plasma ◽  
Silica Glass ◽  
Ablation Process ◽  
X Ray

Ablation of silica glass induced by laser plasma soft X-ray irradiation

2011 ◽  
Vol 94 (9) ◽  
pp. 30-35
Author(s):  
Tetsuya Makimura ◽  
Takashige Fujimori ◽  
Shuichi Torii ◽  
Hiroyuki Niino ◽  
Kouichi Murakami
Keyword(s):  
Laser Plasma ◽  
Silica Glass ◽  
X Ray

scholarly journals Study on Non-Thermal Ablation Process of Silica Glass Using Laser Plasma Soft X-rays toward Nanomachining

2009 ◽  
Vol 129 (7) ◽  
pp. 1186-1191
Author(s):  
Shuichi Torii ◽  
Takashige Fujimori ◽  
Tetsuya Makimura ◽  
Hiroyuki Niino ◽  
Kouichi Murakami
Keyword(s):  
Laser Plasma ◽  
Silica Glass ◽  
Thermal Ablation ◽  
X Rays ◽  
Ablation Process

Chromium implantation in silica glass

1996 ◽  
Vol 11 (1) ◽  
pp. 229-235 ◽  
Author(s):  
E. Cattaruzza ◽  
R. Bertoncello ◽  
F. Trivillin ◽  
P. Mazzoldi ◽  
G. Battaglin ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Photoelectron Spectroscopy ◽  
Silica Glass ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Secondary Ion Mass Spectrometry ◽  
Rutherford Backscattering Spectrometry ◽  
X Ray ◽  
Chromium Silicide ◽  
Secondary Ion

Silica glass was implanted with chromium at the energy of 35 and 160 keV and at fluences varying from 1 × 1016 to 11 × 1016 ions cm−2. In a set of chromium-implanted samples significant amounts of carbon were detected. Samples were characterized by x-ray photoelectron spectroscopy, x-ray-excited Auger electron spectroscopy, secondary ion mass spectrometry, and Rutherford backscattering spectrometry. Chromium silicide and chromium oxide compounds were observed; the presence of carbon in the implanted layers induces the further formation of chromium carbide species. Thermodynamic considerations applied to the investigated systems supply indications in agreement with the experimental evidences.

Analysis of characteristic X-ray generation induced by laser plasma electrons accelerated by an electric field

2001 ◽  
Vol 92 (6) ◽  
pp. 998-1003 ◽  
Author(s):  
A. A. Erokhin ◽  
A. S. Kishinets ◽  
Yu. V. Korobkin ◽  
I. V. Romanov ◽  
V. M. Romanova ◽  
...  
Keyword(s):  
Electric Field ◽  
Laser Plasma ◽  
X Ray

Compact high-average-power laser-plasma x-ray source by cryogenic target

2001 ◽  
Author(s):  
Takayasu Mochizuki ◽  
Atsushi Shimoura ◽  
Sho Amano ◽  
Shuji Miyamoto
Keyword(s):  
Laser Plasma ◽  
Average Power ◽  
High Average Power ◽  
Power Laser ◽  
X Ray ◽  
Cryogenic Target

scholarly journals X-ray transmission grating spectrometer with CCD detector for laser plasma studies

1991 ◽  
Vol 9 (2) ◽  
pp. 579-591 ◽  
Author(s):  
L. Pína ◽  
H. Fiedorowicz ◽  
M. O. Koshevoi ◽  
A. A. Rupasov ◽  
B. Rus ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Dynamic Range ◽  
High Sensitivity ◽  
Array Detector ◽  
Charge Coupled Device ◽  
X Ray ◽  
Transmission Grating ◽  
Hot Plasma ◽  
Ccd Detector ◽  
Wet Processing

A program is under way to develop methods and instrumentation based on charge-coupled device (CCD) sensors for hot plasma diagnostics. We have developed a new X-ray spectrometer in which a freestanding X-ray transmission grating is coupled to a CCD linear array detector with electronic digitized readout replacing film and its wet processing. This instrument measures time-integrated pulsed X-ray spectra with moderate spectral resolution (δλ ≤ 0.6 nm) over a broad spectral range (0.3–2 keV) with high sensitivity, linearity, and large dynamic range. The performance of the device was tested using laser plasma as the X-ray source.

Laser plasma source for soft x-ray imaging in CIOM

1997 ◽  
Author(s):  
Zhongxing Shao ◽  
Zhanshan Wang ◽  
Fengming Xu ◽  
Junxia Lu ◽  
Xingdan Chen
Keyword(s):  
Laser Plasma ◽  
Plasma Source ◽  
X Ray ◽  
X Ray Imaging

scholarly journals Targets for investigation of X-ray laser–plasma emission

1992 ◽  
Vol 10 (4) ◽  
pp. 861-863 ◽  
Author(s):  
R. Suchańska
Keyword(s):  
Laser Plasma ◽  
Plasma Emission ◽  
X Ray ◽  
Inner Diameter

Two methods of target technology for investigation of X-ray laser–plasma emission are presented. The first deals with steel and gold microcapillary targets. They are about 200 μm in inner diameter and about 500 μm in length. The second method deals with metal plus plastic targets of reduced and controlled density in the range of 1.6–8.1 g/cm3 for Cu + polyethylene (PE) and 1.6–7.6 g/cm3 for Fe + PE.

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