Fabrication of Diamond-Like Carbon Microgears in Room-Temperature Curing Nanoimprint Lithography Using Ladder-Type Hydrogen Silsesquioxane

MRS Advances ◽  
2016 ◽  
Vol 1 (16) ◽  
pp. 1119-1124
Author(s):  
Shuji Kiyohara ◽  
Yuto Shimizu ◽  
Ippei Ishikawa ◽  
Toru Harigai ◽  
Hirofumi Takikawa ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Room Temperature ◽  
Electron Cyclotron Resonance ◽  
Sol Gel ◽  
Etching Time ◽  
Diamond Like Carbon ◽  
Pdms Mold ◽  
Hydrogen Silsesquioxane ◽  
Ion Energy ◽  
Mask Material

ABSTRACTWe investigated the fabrication of convex diamond-like carbon (DLC) based microgears in room-temperature curing nanoimprint lithography (RTC-NIL) using the ladder-type hydrogen silsesquioxane (HSQ), as an application for the medical micro electro mechanical system (MEMS). The HSQ which is an inorganic polymer of sol-gel system turns into a gel when exposed to air and has the siloxane bond. Therefore, the HSQ was used as RT-imprinting material, and also used as an oxide mask material in electron cyclotron resonance (ECR) oxygen (O2) ion shower etching. We fabricated the polydimethylsiloxane (PDMS) mold with concave microgear patterns which has 40, 50 and 60 μm-tip diameter and 300 nm-depth. We carried out the RTC-NIL process using the PDMS mold under the following optimum conditions of 0.10 MPa-imprinting pressure and 1.0 min-imprinting time. We found that the residual layer of imprinted HSQ microgear patterns was removed with ECR trifluoromethane (CHF3) ion shower under the following conditions of 300 eV-ion energy and 2.0 min-etching time, and then microgears of the HSQ on the DLC film were etched with ECR O2 ion shower under the following conditions of 400 eV-ion energy and 10 min-etching time. As a result, the convex DLC based microgears which have 40, 50 and 60 μm-tip diameter and 400 nm-height were fabricated with high accuracy in the new fabrication process of RTC-NIL.

Fabrication of Diamond-Like Carbon Emitter Patterns by Room-Temperature Curing Nanoimprint Lithography with PDMS Molds Using Polysiloxane

MRS Advances ◽  
2016 ◽  
Vol 1 (16) ◽  
pp. 1075-1080 ◽  
Author(s):  
Shuji Kiyohara ◽  
Shogo Yoshida ◽  
Ippei Ishikawa ◽  
Toru Harigai ◽  
Hirofumi Takikawa ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Room Temperature ◽  
Electron Cyclotron Resonance ◽  
Mold Material ◽  
Etching Time ◽  
Diamond Like Carbon ◽  
Curing Time ◽  
Flat Panel Display ◽  
Ion Energy ◽  
Mask Material

ABSTRACTWe investigated the fabrication of diamond-like carbon (DLC) emitter patterns by room-temperature curing nanoimprint lithography (RTC-NIL) with polydimethylsiloxane (PDMS) molds using polysiloxane, as an application to the emitter for the next generation flat panel display.The DLC which has excellent properties similar to diamond properties was used as a pattern material. A PDMS was used as a mold material and fabricated by the following optimum conditions of the first curing time at RT for 36 h and the second curing time at the temperature of 150 °C for 15 mins. The polysiloxane is in the state of sticky liquid at RT and stable in air. Therefore, the polysiloxane was used the electron beam (EB) resist and oxide mask material in EB lithography, and also used as RT-imprint material.First, we fabricated the PDMS mold with pit array. Each dot is 5 µm-diameter and 400 nm-depth. We carried out the RTC-NIL process with PDMS molds using polysiloxane under the following optimum imprint conditions of 0.5 MPa-imprinting pressure, 1.5 min-the time between spin-coat and imprint, and 5 min-imprinting time. Next, the residual layer of imprinted polysiloxane pattern was 450 nm and then was removed with electron cyclotron resonance (ECR) trifluoromethane (CHF3) ion shower under the conditions of 300 eV-ion energy and 3 min-etching time. Then, we processed the imprinted polysiloxane patterns on the DLC film with an ECR oxygen (O2) ion shower under the conditions of 400 eV-ion energy and 12 min-etching time. As a result, we succeeded in fabricating convex DLC emitter patterns with high accuracy which has 5 µm-diameter and 500 nm-height.

Fabrication of Diamond Nanopit arrays by Room-temperature Curing Nanoimprint Lithography Using Glass-like Carbon Molds

2012 ◽  
Vol 1395 ◽  
Author(s):  
Shuji Kiyohara ◽  
Chigaya Ito ◽  
Ippei Ishikawa ◽  
Hirofumi Takikawa ◽  
Yoshio Taguchi ◽  
...  
Keyword(s):  
Diamond Film ◽  
Nanoimprint Lithography ◽  
Room Temperature ◽  
Electron Cyclotron Resonance ◽  
Chemical Vapor ◽  
Mold Material ◽  
Oxygen Ion ◽  
Mask Material ◽  
Chemical Vapor Deposited ◽  
Etching Selectivity

ABSTRACTWe have proposed the use of glass-like carbon (GC), as mold material because the 27-maximum etching selectivity of polysiloxane film against GC, which was approximately sixtimes larger than that of polysiloxane film against chemical vapor deposited (CVD) diamond film. We have investigated the fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography (RTC-NIL) using GC mold, as applications to the emitter and the micro-gear. The polysiloxane has in the state of sticky liquid at room-temperature and negative-exposure characteristic. Therefore, the polysiloxane was used as RTC-imprint resist material, and also used as electron beam (EB) resist (oxide mask) material in EB lithography. We have fabricated the cylindrical GC nanodot mold with 500 nm-diameter, 600 nm-height and 2 μm-pitch. We carried out RTC-NIL using GC mold under the following optimum conditions: time from spin-coating to imprint of 1 min, imprinting pressure of 0.5 MPa and imprinting time of 5min. Then, we have processed the diamond film with an electron cyclotron resonance (ECR) oxygen ion shower. We have fabricated diamond nanopit array with 250 nm-depth and 500 nm-diameter. The diameter of diamond nanopit pattern was in good agreement with that of GC mold. Moreover, the depth of the diamond nanopit patterns fabricated by RTC-NIL using cylindrical GC mold was three times larger than that using conical diamond mold.

Optical Band Gap of Diamond-Like Carbon Films as a Function of RF Substrate Bias

1989 ◽  
Vol 162 ◽  
Author(s):  
P. W. Pastel ◽  
W. J. Varhue
Keyword(s):  
Band Gap ◽  
Cyclotron Resonance ◽  
Optical Band Gap ◽  
Electron Cyclotron Resonance ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Substrate Bias ◽  
Ion Energy ◽  
Resonance Plasma

ABSTRACTDiamond-like carbon films have been deposited with a low temperature 2.45 GHz electron cyclotron resonance plasma enhanced chemical vapor deposition system. The bombarding ion energy was independently controlled with a RF bias to the substrate. The production rate of reactant species and the impinging ion energy are decoupled with this system. The optical band gap decreased from 2.7 to 1.2 eV as substrate bias was increased from 0 to -140 V.

Room-Temperature Nanoimprint Lithography

2006 ◽  
Vol 961 ◽  
Author(s):  
Ken-Ichiro Matsui ◽  
Shinji Matsui
Keyword(s):  
Liquid Phase ◽  
Temperature Dependence ◽  
Nanoimprint Lithography ◽  
Room Temperature ◽  
Hydrogen Silsesquioxane ◽  
Wide Range ◽  
One Step

ABSTRACTRoom-temperature nanoimprint lithography (RT-NIL) using spin-coated hydrogen silsesquioxane (HSQ) resin as the replication material was developed. HSQ pattern with 50 nm linewidth was successfully obtained by the RT-NIL. Postbaking temperature dependence of a HSQ imprinted depth on a mold linewidth was investigated. HSQ imprinted depth had a dependence on the mold linewidth. This revealed that the RT-NIL is suitable for the linewidths of below 1 mm. Furthermore, we have also developed a new imprinting technique that uses liquid-phase hydrogen silsesquioxane (HSQ) as an alternative to the spin-coated HSQ resin. The liquid-phase HSQ imprint technique enabled fabrication of various HSQ patterns with a wide range of linewidths from 25 nm to 300 mm. Arbitrary patterns, including both submicron and greater than 100 micron patterns, were simultaneously replicated with a one-step imprint process, something very difficult to accomplish with spin-coated HSQ. Moreover, after imprinting, the residual HSQ layer in the compressed area was less than 10 nm thick.

Diamond Nanopit Arrays Fabricated by Room-Temperature Nanoimprinting using Diamond Molds

2011 ◽  
Vol 1282 ◽  
Author(s):  
Shuji Kiyohara ◽  
Masaya Kumagai ◽  
Yoshio Taguchi ◽  
Yoshinari Sugiyama ◽  
Yukiko Omata ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Room Temperature ◽  
Electron Cyclotron Resonance ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Ion Beam Etching ◽  
Minimum Diameter ◽  
Oxygen Ion ◽  
Pressure Time ◽  
Chemical Vapor Deposited

ABSTRACTWe have investigated the nanopatterning of chemical vapor deposited (CVD) diamond films in room-temperature nanoimprint lithography (RT-NIL), using a diamond nanodot mold. We have proposed the use of polysiloxane as an electron beam (EB) mask and RT-imprint resist materials. The diamond molds of cylinder dot using the RT-NIL process were fabricated with polysiloxane oxide mask in EB lithography technology. The dot in minimum diameter is 500 nm. The pitch between the dots is 2 μm, and dot has a height of about 600 nm. It was found that the optimum imprinting conditions for the RT-NIL : time from spin-coating to imprinting t1 of 1 min , pressure time t2 of 5 min, imprinting pressure P of 0.5 MPa. The imprint depth obtained after the press under their conditions was 500 nm. We carried out the RT-NIL process for the fabrication of diamond nanopit arrays, using the diamond nanodot molds that we developed. The resulting diamond nanopit arrays with 500 nm-diameter and 200 nm-depth after the electron cyclotron resonance (ECR) oxygen ion beam etching were fabricated. The diameter of diamond nanopit arrays was in good agreement with that of the diamond nanodot mold.

Fabrication of DLC-Based Micro-Gear Patterns by Room-Temperature Curing Nanoimprint Lithography Using Glass-Like Carbon Molds

2013 ◽  
Vol 1511 ◽  
Author(s):  
Shuji Kiyohara ◽  
Tomu Ikegaki ◽  
Chigaya Ito ◽  
Ippei Ishikawa ◽  
Hideto Tanoue ◽  
...  
Keyword(s):  
Diamond Film ◽  
Nanoimprint Lithography ◽  
Room Temperature ◽  
High Accuracy ◽  
Residual Layer ◽  
Mold Material ◽  
Etching Time ◽  
Optimum Conditions ◽  
Dlc Film ◽  
Etching Selectivity

ABSTRACTThe fabrication of diamond-like carbon (DLC) micro-gear by room temperature curing nanoimprint lithography (RTC-NIL) using glass-like carbon (GC) molds as applications to the DLC-based medical MEMS (Micro Electronic Mechanical Systems) was investigated. The DLC film which has excellent properties similar to chemical vapor deposited (CVD) diamond films was used as the patterning material. We propose GC as mold material because GC has higher etching selectivity than a diamond film. The etching selectivity of polysiloxane film against a GC substrate is about 5 times as high as that of a diamond film. Therefore we fabricated the GC molds that have micro-gear patterns with 30 µm-tip diameter and 500 nm-tooth thickness. We carried out the RTC-NIL process using the GC micro-gear molds under the following optimum conditions. 1 min-time from spin-coating to imprint: t1, 0.5 MPa-imprinting pressure: P and 5 min-holding time: t2, and then the imprinted polysiloxane pattern on DLC film was processed with an electron cyclotron resonance (ECR) oxygen ion shower. However, we were not able to fabricate micro-gear patterns in high accuracy because of a remaining residual layer on the DLC film. Therefore we propose the removing process for the residual layer with trifluoromethane (CHF3) ion shower under the optimum conditions of 300 eV-ion energy and 4 min-etching time. As a result, we succeeded to fabricate concave DLC-based micro-gear patterns in high accuracy which has 30 µm-tip diameter and 1 µm-depth.

scholarly journals Room-Temperature Nanoimprint using Liquid-Phase Hydrogen Silsesquioxane with PDMS mold

2009 ◽  
Vol 22 (2) ◽  
pp. 193-194 ◽  
Author(s):  
Yuji Kang ◽  
Makoto Okada ◽  
Ken-ichiro Nakamatsu ◽  
Yuichi Haruyama ◽  
Kazuhiro Kanda ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Room Temperature ◽  
Pdms Mold ◽  
Hydrogen Silsesquioxane

Nanofabrication of DLC-dot Arrays by Room-temperature Curing Imprint-liftoff Method

2013 ◽  
Vol 1511 ◽  
Author(s):  
Shuji Kiyohara ◽  
Shohei Matta ◽  
Ippei Ishikawa ◽  
Hideto Tanoue ◽  
Hirofumi Takikawa ◽  
...  
Keyword(s):  
Room Temperature ◽  
Polished Glass ◽  
Aluminum Film ◽  
Mold Material ◽  
Ion Energy ◽  
Dlc Film ◽  
Oxygen Ion ◽  
Mask Material ◽  
Etching Selectivity ◽  
20 Nm

ABSTRACTAs an application to the nanoemitter, we investigated the nanofabrication of diamond-like carbon (DLC)-dot arrays by room-temperature curing imprint-liftoff (RTCIL) method using aluminum mask. The DLC film which has excellent properties similar to diamond properties was used as the patterning material. A polished glass like carbon (GC) was used as a mold material. The polysiloxane in the state of sticky liquid at room temperature and stable in air exhibits a negative-exposure characteristics. Therefore, the polysiloxane was used as electron beam (EB) resist and oxide mask material in EB lithography, and also used as RTC-imprint resist material. An aluminum was used as oxide metal mask material of liftoff. We have fabricated the GC mold of dot arrays with 5 µm-square and 500 nm-height. We carried out the RTCIL process using the GC mold under the following optimum imprint conditions: 0.5 MPa-imprinting pressure and 5 min- holding time. Aluminum film on the imprinted polysiloxane was prepared by vacuum evaporation method and its thickness is 20 nm. Finally, the polysiloxane patterns were removed with acetone and aluminum mask patterns were fabricated. We found that the maximum etching selectivity of aluminum film against DLC film was as high as 35, which was obtained under an ion energy of 400 eV. Then we processed the patterned aluminum on DLC film with an ECR oxygen ion shower. We fabricated DLC-dot arrays with 5 µm-square and 400 nm-height with an aspect ratio of 0.08.

Improved Sol-Gel Materials for Efficient Solid State Dye Lasers

1993 ◽  
Vol 329 ◽  
Author(s):  
Michael Canva ◽  
Patrick Georges ◽  
Jean-Fran^ois Perelgritz ◽  
Alain Brun ◽  
Fréddric Chaput ◽  
...  
Keyword(s):  
Solid State ◽  
Physical Properties ◽  
Room Temperature ◽  
Sol Gel ◽  
Tunable Lasers ◽  
Optical Quality ◽  
Dye Lasers ◽  
Laser Dyes ◽  
Host Matrix ◽  
Host Matrices

AbstractPhotoresistant laser dyes were trapped in silica based xerogel host matrices to obtain solid state tunable lasers. For this purpose very dense xerogel samples with improved chemical and physical properties were prepared at room temperature by the sol-gel technology. The as-prepared materials were polished to obtain optical quality surfaces and were used as new lasing media.Lasing action of such different dyes as rhodamine, perylene and pyrromethene doping dense sol-gel matrices was demonstrated. Efficiencies of 30 % or lifetimes of more than 100,000 shots were achieved with different new ≤dye dopant/host matrix≥ couples. Their different performances are reviewed and discussed.

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