Preparation of wurtzitic AlN thin films with a novel crystallographic alignment on MgO substrates by molecular-beam epitaxy
1998 ◽
Vol 13
(6)
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pp. 1414-1417
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Keyword(s):
Thin films of wurtzitic AlN have been deposited by molecular-beam epitaxy onto (001) oriented MgO substrates. The films are epitactic and align with the and the , as evidenced by transmission electron microscopy. This configuration, which matches a close-packed direction of the film and substrate, allows for growth of two symmetrically equivalent orientation variants of the AlN film. These variants are distinguished by a 90° rotation about the direction that is normal to the substrate surface. Each variant also aligns the and the to within 5° of being parallel to the (200)MgO. The microstructure of the AlN films and origins of these novel alignments are discussed.
2016 ◽
Vol 30
(20)
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pp. 1650269
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1999 ◽
Vol 38
(Part 1, No. 8)
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pp. 4673-4675
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1995 ◽
Vol 150
◽
pp. 388-393
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