Role of oxygen in the growth of carbon nanotubes on metal alloy fibers by plasma-enhanced chemical vapor deposition

2009 ◽  
Vol 24 (4) ◽  
pp. 1536-1542 ◽  
Author(s):  
Young Kyun Moon ◽  
Chang Goo Jung ◽  
Seok Joo Park ◽  
Tae Gyu Kim ◽  
Soo H. Kim

A method allowing for the stable growth of carbon nanotubes (CNTs) on the surface of a fibrous metal mesh substrate (SUS304) was developed with the assistance of the microwave plasma-enhanced chemical vapor deposition process. The controlled addition of up to ∼13% of O2 to the CH4 plasma reacting gas flow was found to promote the growth of the CNTs by oxidizing the amorphous carbon and removing the active H2 radicals. However, excessive amounts of O2 (i.e., fraction of O2 > ∼13%) and H2 were found to play a negative role in the growth of the CNTs. The control of the density and length of the CNTs was also achieved by varying the H2 plasma reduction time and CH4 plasma reacting time, respectively. Longer H2 reduction pretreatment of the catalytic metal islands resulted in the formation of a less dense CNT forest with craters. When the growth time of the CNTs was increased to ∼20 min, their length was increased to ∼10 μm. However, when the growth time of the CNTs exceeded 20 min, their length was significantly decreased, indicating that the continuous presence of O2 in the CH4 plasma destroys the preformed CNTs due to the oxidation reaction.

2013 ◽  
Vol 667 ◽  
pp. 411-414
Author(s):  
S. Aishah ◽  
M.Z. Nuraini ◽  
S.F. Nik ◽  
Mohamad Rusop

Carbon nanotubes (CNTs) were deposited on silicon wafer (Si) by Thermal Chemical Vapor Deposition (TCVD). The new starting material of fermented tapioca was used as carbon source. The gas flow of Argon (Ar) was constant at 70 bubbles per minute and 20 minutes of deposition time. Before the deposition process, the silicon wafer was coated with Nickel catalyst using spin coater. Various parameters such as vaporization temperature and deposition temperature have been studied. Surface morphology and uniformity were characterized using FESEM. The CNTs were structurally characterized using FESEM at different magnification to see the differences of CNTs growth at different temperature of the starting material. The surface morphology and uniformity of CNTs were dependent to parameters.


2001 ◽  
Vol 7 (S2) ◽  
pp. 428-429
Author(s):  
Paula P. Provencio ◽  
Michael P. Siegal ◽  
Donald L. Overmyer

Carbon nanotubes have previously been grown on Ni coated glass, aligned vertical to the substrate over a multi-centimeter square area1. Under vacuum, the aligned nanotubes were grown below 666° C (strain point of the best display glass) by plasma-enhanced hot filament, chemical vapor deposition. It was found, the size and alignment of the nanotubes could be varied by changing the dwell time and the thickness of the catalytic Ni layer by plasma etching. in more recent, ongoing studies, the size of carbon nanotubes is varied by changing the growth temperature and dwell time under acetylene/nitrogen atmosphere using chemical vapor deposition onto W and Ni coated Si.Multiwall carbon nanotube films are grown using a thermally-activated chemical vapor deposition process. Thin Ni catalyst layers are sputtered onto W-coated Si(100) and reduced in a 600°C CO anneal. Nanotubes then grow at temperatures ranging from 630 - 790°C in an acetylene/nitrogen mixture.


Sign in / Sign up

Export Citation Format

Share Document