Sharp Needles: Fabrication of Tungsten Nanotips by AC Electrochemical Etching and Laser Enhanced Etching for Nanoprobing on Interconnects of Advanced Technology Nodes.

2013 ◽  
Vol 1553 ◽  
Author(s):  
M. K. Dawood ◽  
Z.H. Mai ◽  
T. H. Ng ◽  
H. Tan ◽  
P.K. Tan ◽  
...  

ABSTRACTSharper nanotips are required for application in nanoprobing systems due to a shrinking contact size with each new transistor technology node. We describe a two-step etching process to fabricate W nanotips with controllable tip dimensions. The first process is an optimized AC electrochemical etching in KOH to fabricate nanotips with a radius of curvature (ROC) down to 90 nm. This was followed by a secondary nanotip sharpening process by laser irradiation in KOH. High aspect ratio nanotips with ROC close to 20 nm were obtained. Finally we demonstrate the application of the fabricated nanotips for nanoprobing on advanced technology SRAM devices.

Author(s):  
M. K. Dawood ◽  
T. H. Ng ◽  
H. Tan ◽  
P. K. Tan ◽  
C. K. Oh ◽  
...  

Abstract Rapid technology scaling results in ever shrinking device size. As such, sharper nanotips are required for application in nanoprobing systems. In this work, we present a two-step methodology of fabricating tungsten nanotips with radius of curvature down to 20 nm by using and optimized AC electrochemical etching of tungsten in KOH followed by laser irradiation in KOH. Finally we show the application of the fabricated nanotips with different radius of curvature (ROC) for nanoprobing.


2012 ◽  
Vol 195 ◽  
pp. 235-238 ◽  
Author(s):  
Xiu Mei Xu ◽  
Guy Vereecke ◽  
Erik van den Hoogen ◽  
Jens Smeers ◽  
Silvia Armini ◽  
...  

In semiconductor fabrication, pattern collapse of high aspect ratio structures after wet processing has been a critical issue and attracted a lot of interest. On the other hand, very little attention is spent on the potential wetting issues as feature dimensions are continuously scaled down and novel materials with different wetting properties are used in new technology nodes. In this work we investigate the wettability of nanopatterned silicon substrates with different surface modifications.


2014 ◽  
Vol 105 (12) ◽  
pp. 123111 ◽  
Author(s):  
Torsten Schmidt ◽  
Miao Zhang ◽  
Shun Yu ◽  
Jan Linnros

2018 ◽  
Vol 8 (5) ◽  
pp. 1171-1177 ◽  
Author(s):  
Badriyah Alhalaili ◽  
Daniel M. Dryden ◽  
Ruxandra Vidu ◽  
Soroush Ghandiparsi ◽  
Hilal Cansizoglu ◽  
...  

2011 ◽  
Vol 99 (14) ◽  
pp. 143108 ◽  
Author(s):  
J. S. Lloyd ◽  
A. Williams ◽  
R. H. Rickman ◽  
A. McCowen ◽  
P. R. Dunstan

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