Adsorption of Silicon Tetrachloride on Si(111) 7×7

1988 ◽  
Vol 131 ◽  
Author(s):  
P. Gupta ◽  
P. A. Coon ◽  
B. G. Koehler ◽  
S. M. George
Keyword(s):  
Surface Temperature ◽  
Thermal Desorption ◽  
Temperature Programmed Desorption ◽  
Silicon Tetrachloride ◽  
Sticking Coefficient ◽  
Adsorption Model ◽  
Temperature Programmed ◽  
Kinetics Of

ABSTRACTThe kinetics of SiCl4 adsorption on Si(lll) 7×7 were studied using laser induced thermal desorption (LITD) and temperature programmed desorption (TPD) techniques. The initial reactive sticking coefficient of SiCl4 on Si(lll) 7×7 was observed to decrease with increasing surface temperature. This decrease was consistent with a precursor-mediated adsorption model. Both LITD and TPD experiments monitored SiCl2 as the main desorption product. These results suggest that SiC12 may be the stable chlorine species on the Si(lll) 7×7 surface.

Oxidation Kinetics of Silicon Surfaces: Reactive Sticking Coefficient, Apparent Saturation Coverage and Effect of Surface Hydrogen

1988 ◽  
Vol 131 ◽  
Author(s):  
S. M. George ◽  
P. Gupta ◽  
C. H. Mak ◽  
P. A. Coon
Keyword(s):  
Surface Temperature ◽  
Silicon Surfaces ◽  
Sticking Coefficient ◽  
Initial Oxidation ◽  
Surface Hydrogen ◽  
Oxygen Coverage ◽  
Saturation Coverage ◽  
Temperature Programmed ◽  
Kinetics Of ◽  
Effect Of Surface

ABSTRACTThe kinetics of the initial oxidation of silicon surfaces by O2 were studied using laser-induced thermal desorption (LITD), temperature programmed desorption (TPD) and Fourier Transform Infrared (FTIR) spectroscopy. The LITD results showed that the oxidation of Si(111)7×7 by O2 was characterized by two kinetic processes: an initial rapid oxygen uptake followed by a slower growth that asymptotically approached an apparent saturation oxygen coverage. The initial reactive sticking coefficient of O2 on Si(111)7×7 decreased with surface temperature. In contrast, TPD experiments on Si(111)7×7 and FTIR studies on porous silicon demonstrated that the apparent saturation oxygen coverage increased as a function of surface temperature. Experiments with preadsorbed hydrogen also revealed that silicon oxidation was inhibited as a function of increasing hydrogen coverage on the Si(111)7×7 surface.

scholarly journals Engineering of TMDC-OSC Hybrid Interfaces: The Thermodynamics of Unitary and Mixed Acene Monolayers on MoS2

2020 ◽  
Author(s):  
Stefan R. Kachel ◽  
Pierre Martin Dombrowski ◽  
Tobias Breuer ◽  
Michael Gottfried ◽  
Gregor Witte
Keyword(s):  
Monte Carlo ◽  
Molecular Mobility ◽  
Temperature Programmed Desorption ◽  
Model System ◽  
Desorption Kinetics ◽  
Temperature Programmed ◽  
Kinetics Of

Here, we use temperature-programmed desorption (TPD) and Monte Carlo (MC) simulations<br>of TPD traces to characterize the desorption kinetics of pentacene (PEN) and perfluoropentacene (PFP) on MoS2 as a model system for OSCs on TMDCs. We show that the monolayers of PEN and PFP are thermally stabilized compared to their multilayers, which allows to prepare nominal monolayers by selective desorption of multilayers. This stabilization is, however, caused by entropy due to a high molecular mobility rather than an enhanced molecule-substrate bond. Consequently, the nominal monolayers are not densely packed films.

Adsorption and Desorption Kinetics for Chlorosilanes on Si(111) 7×7

1990 ◽  
Vol 204 ◽  
Author(s):  
P. Gupta ◽  
P.A. Coon ◽  
B.G. Koehler ◽  
M.L. Wise ◽  
S.M. George
Keyword(s):  
Activation Energy ◽  
Surface Coverage ◽  
Temperature Programmed Desorption ◽  
Desorption Kinetics ◽  
Sticking Coefficient ◽  
Temperature Dependent ◽  
Adsorption And Desorption ◽  
Desorption Activation Energy ◽  
Temperature Programmed ◽  
Sticking Coefficients

ABSTRACTThe adsorption and desorption kinetics for SiCl4 and SiCl2H2 on Si(111) 7×7 were studied using laser-induced thermal desorption (LITD) and temperature programmed desorption (TPD) techniques. Both LITD and TPD experiments monitored SiCl2 as the main desorption product at 950 K at all coverages of SiCl4 and SiCl2H2 on Si(111) 7×7.HC1 desorption at 850 K and H2 desorption at 810 K were also observed following SiCl2H2 adsorption. Isothermal LITD measurements of SiCl4 and SiCl2H2) adsorption on Si(111) 7×7 revealed that the initial reactive sticking coefficient decreased with increasing surface temperature for both molecules. The temperature-dependent sticking coefficients were consistent with precursor-mediated adsorption kinetics. Isothermal LITD studies of SiC12 desorption revealed second-order SiCl2 desorption kinetics. The desorption kinetics were characterizedby a desorption activation energy of Ed = 67 kcal/mol and a preexponential of vd = 3.2 cm2/s. TPD studies observed that the HCI desorption yield decreased relative to H2 and SiCl2 desorption as a function of surface coverage following SiCl2H2 exposure. These results indicate that when more hydrogen desorbs as H2 at higher coverages, The remaining chlorine is forced to desorb as SiCl 2.

scholarly journals Engineering of TMDC-OSC Hybrid Interfaces: The Thermodynamics of Unitary and Mixed Acene Monolayers on MoS2

2020 ◽  
Author(s):  
Stefan R. Kachel ◽  
Pierre Martin Dombrowski ◽  
Tobias Breuer ◽  
Michael Gottfried ◽  
Gregor Witte
Keyword(s):  
Monte Carlo ◽  
Molecular Mobility ◽  
Temperature Programmed Desorption ◽  
Model System ◽  
Desorption Kinetics ◽  
Temperature Programmed ◽  
Kinetics Of

Here, we use temperature-programmed desorption (TPD) and Monte Carlo (MC) simulations<br>of TPD traces to characterize the desorption kinetics of pentacene (PEN) and perfluoropentacene (PFP) on MoS2 as a model system for OSCs on TMDCs. We show that the monolayers of PEN and PFP are thermally stabilized compared to their multilayers, which allows to prepare nominal monolayers by selective desorption of multilayers. This stabilization is, however, caused by entropy due to a high molecular mobility rather than an enhanced molecule-substrate bond. Consequently, the nominal monolayers are not densely packed films.

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