Oxygen Precipitation Nonuniformity for Thermal History Around 723K During Cz Crystal Growth

1992 ◽  
Vol 262 ◽  
Author(s):  
I. Fusegawa ◽  
H. Yamagishi
Keyword(s):  
Crystal Growth ◽  
Thermal History ◽  
Silicon Single Crystal ◽  
Nonuniform Distribution ◽  
Precipitation Process ◽  
Thermal Treatments ◽  
Distribution Profile ◽  
Oxygen Precipitation ◽  
Thermal Histories ◽  
The One

ABSTRACTWe investigated phenomena of oxygen precipitation nonuni-formity along crystal growth axis due to different thermal histories during CZ crystal growth. The oxygen precipitation process employed in this paper was two-step thermal treatments consisting of the first annealing in nitrogen ambient at 1073K for 4 hrs and the second annealing in dry oxygen ambient at 1273K for 16 hrs. The amount of the oxygen precipitation at the shoulder of a silicon single crystal was higher than the one at the tail end. We found this nonuniform distribution profile was due to the thermal history around 723K during crystal growth. Such an nonuniformity could be improved remarkably by adding a preannealing in dry oxygen ambient at 723K for 2 hrs before the two-step thermal treatment.

The Effect of D-Defect in Silicon Single Crystal on Oxygen Precipitation

1992 ◽  
Vol 262 ◽  
Author(s):  
I. Fusegawa ◽  
N. Fujimaki ◽  
H. Yamagishi
Keyword(s):  
Crystal Growth ◽  
Single Crystal ◽  
Single Crystals ◽  
Thermal Process ◽  
Flow Patterns ◽  
Optical Microscope ◽  
Silicon Single Crystal ◽  
Thermal Treatments ◽  
Oxygen Precipitation ◽  
Predominant Factor

ABSTRACTWe investigated the effect of D-defect in CZ silicon single crystals on the oxygen precipitation by two-step thermal treatments consisting of the first annealing in nitrogen ambient at 1073K and the second annealing in dry oxygen ambient at 1273K. The density of D-defect was measured by counting ‘flow patterns’ using an optical microscope after preferential etching in Secco's solution for 30 minutes. It was found that the amount of oxygen precipitation along the growth axis was not affected by D-defect. The predominant factor of the oxygen precipitation after the two-step thermal process is the nuclei of oxygen precipitation generated around 723K during CZ crystal growth.

Characteristics of Oxygen Precipitation in Silicon Wafers Preannealed at 723K

1992 ◽  
Vol 262 ◽  
Author(s):  
I. Fusegawa ◽  
E. Iino ◽  
T. Hirohata ◽  
H. Yamagishi
Keyword(s):  
Crystal Growth ◽  
Thermal Treatment ◽  
Single Crystals ◽  
Single Step ◽  
Nonuniform Distribution ◽  
The Other ◽  
Growth Axis ◽  
Oxygen Precipitation ◽  
New Process ◽  
The One

ABSTRACTWe investigated phenomena of oxygen precipitation in silicon single crystals by two kinds of thermal treatment, supposing a CMOS fabrication process. The one consisted of the first annealing at 1123K for 4 hrs and the second annealing at 1423K for 16 hrs. The other one consisted of the annealing at 1273K for 4 hrs and the second annealing at 1423K for 13 hrs. In the results, a single-step preannealing at 723K for 2 hrs was effective for the oxygen precipitation by the former process and nonuniform distribution profiles along crystal growth axis were well improved, however, insufficiently improved against the latter process. We considered a two-step preannealing process consisting of the first annealing at 723K for 2 hrs and the second annealing at 923K for 2 hrs. This new process was effective for the oxygen precipitation by the latter process. Especially, we could obtain uniform distribution profiles of oxygen precipitation along a crystal growth axis.

STM studies of crystal growth

1991 ◽  
Vol 49 ◽  
pp. 374-375
Author(s):  
M. G. Lagally
Keyword(s):  
Crystal Growth ◽  
Molecular Beam ◽  
Chemical Vapor ◽  
Sputter Deposition ◽  
Field Of View ◽  
Scanning Tunneling ◽  
Wide Field ◽  
Tunneling Microscopy ◽  
Wide Field Of View ◽  
The One

It has been recognized since the earliest days of crystal growth that kinetic processes of all Kinds control the nature of the growth. As the technology of crystal growth has become ever more refined, with the advent of such atomistic processes as molecular beam epitaxy, chemical vapor deposition, sputter deposition, and plasma enhanced techniques for the creation of “crystals” as little as one or a few atomic layers thick, multilayer structures, and novel materials combinations, the need to understand the mechanisms controlling the growth process is becoming more critical. Unfortunately, available techniques have not lent themselves well to obtaining a truly microscopic picture of such processes. Because of its atomic resolution on the one hand, and the achievable wide field of view on the other (of the order of micrometers) scanning tunneling microscopy (STM) gives us this opportunity. In this talk, we briefly review the types of growth kinetics measurements that can be made using STM. The use of STM for studies of kinetics is one of the more recent applications of what is itself still a very young field.

3D simulation of feed rod melting in floating zone silicon single crystal growth

2015 ◽  
Vol 51 (1) ◽  
pp. 25-36 ◽  
Author(s):  
M. Plāte ◽  
A. Krauze ◽  
J. Virbulis
Keyword(s):  
Crystal Growth ◽  
Single Crystal ◽  
Single Crystal Growth ◽  
Silicon Single Crystal ◽  
3D Simulation ◽  
Floating Zone

Unsteady 3D and analytical analysis of segregation process in floating zone silicon single crystal growth

2009 ◽  
Vol 45 (4) ◽  
pp. 549-556 ◽  
Author(s):  
K. Lācis ◽  
◽  
A. Muižnieks ◽  
N. Jēkabsons ◽  
A. Rudevičs ◽  
...  
Keyword(s):  
Crystal Growth ◽  
Single Crystal ◽  
Single Crystal Growth ◽  
Silicon Single Crystal ◽  
Floating Zone ◽  
Analytical Analysis ◽  
Segregation Process

Relationship between grown-in defects and thermal history during CZ Si crystal growth

1997 ◽  
Vol 180 (3-4) ◽  
pp. 363-371 ◽  
Author(s):  
K. Takano ◽  
M. Iida ◽  
E. Iino ◽  
M. Kimura ◽  
H. Yamagishi
Keyword(s):  
Crystal Growth ◽  
Thermal History

Application of dynamic and combined magnetic fields in the 300mm silicon single-crystal growth

2002 ◽  
Vol 5 (4-5) ◽  
pp. 347-351 ◽  
Author(s):  
Erich Tomzig ◽  
Janis Virbulis ◽  
Wilfried von Ammon ◽  
Yuri Gelfgat ◽  
Leonid Gorbunov
Keyword(s):  
Crystal Growth ◽  
Magnetic Fields ◽  
Single Crystal ◽  
Single Crystal Growth ◽  
Silicon Single Crystal ◽  
Combined Magnetic Fields
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