Total Reflection X-Ray Fluorescence (TXRF)

1994 ◽  
Vol 354 ◽  
Author(s):  
R. S. Hockett
Keyword(s):  
Synchrotron Radiation ◽  
Metal Contamination ◽  
Total Reflection ◽  
Semiconductor Processing ◽  
X Ray ◽  
Analytical Technique ◽  
Semiconductor Substrates ◽  
The Future ◽  
Surface Metal

AbstractTotal reflection X-Ray Fluorescence (TXRF) is a glancing x-ray analytical technique which is used primarily to measure surface metal contamination on semiconductor substrates. This is a review of Total reflection X-Ray Fluorescence (TXRF) applications for silicon semiconductor processing. In addition, some comments are made about the future of TXRF, and in particular, synchrotron radiation TXRF (SR-TXRF)

scholarly journals Multielement analysis of plant extracts with potential use in the treatment of peptic ulcers by synchrotron radiation total reflection X-ray fluorescence

PeerJ ◽  
2018 ◽  
Vol 6 ◽  
pp. e5375
Author(s):  
Leticia Diniz Vieira ◽  
Káthia Takeda da Silva ◽  
Rodrigo Sanchez Giarola ◽  
Guilherme Franco Inocente ◽  
Hélio Kushima ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Intermediate Stage ◽  
Total Reflection ◽  
New Drugs ◽  
Peptic Ulcers ◽  
X Ray ◽  
Analytical Technique ◽  
Methanolic Extracts ◽  
Synchrotron Light ◽  
Almost All

Some plants popularly employed for the treatment of peptic ulcers have proved to be attractive sources of new drugs. Despite extensive research, the pharmacological and toxicological potentials of these plants are not fully understood. In this context, the aim of this work was to analyze the multielemental composition of the methanolic extracts of three of those plants, Alchornea glandulosa (AG), Davilla elliptica (DE) and Davilla nitida (DN), with the intention of contributing to the understanding of the mechanisms of action of these extracts. For this purpose, we used the analytical technique of total reflection X-ray fluorescence (TXRF) by synchrotron radiation at the Brazilian Synchrotron Light Source (LNLS/CNPEM). It was possible to determine the concentrations of the elements: P, S, Cl, K, Ca, Ti, Cr, Mn, Fe, Ni, Cu, Zn, Rb and Br in all of the samples. Selenium (Se) was detected only in the DN extract. An inverse relationship between the concentrations of elements with proven effectiveness and the gastroprotective activity of extracts considering induction protocols with ethanol and non-steroidal anti-inflammatory drugs (NSAIDs) was obtained. This data suggests that the function of the extract is not only associated with providing the elements for restoring the gastric mucosa but that it also promotes the displacement of these elements from other parts of the mucosa to the damaged area. Correlations between the concentrations of the elements were also obtained. In the DE extract, which is the most effective extract for both induction protocols, the obtained correlations were above 70% among almost all of the elements, and no anticorrelations were found. For the other two extracts, in the less effective extract (AG) anticorrelations above 70% were predominantly found. Meanwhile, in the DN extract, a few high anticorrelations were found, which may explain its intermediate stage of effectiveness.

Trace Analysis by TXRF

1994 ◽  
Vol 38 ◽  
pp. 687-690
Author(s):  
R. S. Hockett
Keyword(s):  
Trace Analysis ◽  
Semiconductor Industry ◽  
Residue Analysis ◽  
Detection Limits ◽  
Total Reflection ◽  
X Ray ◽  
Semiconductor Substrates ◽  
Recent Developments ◽  
Surface Metal ◽  
Analytical Laboratories

Abstract Total reflection X-Ray FKiorescence (TXRF) originally was developed for trace analysis of small residues but has become a widespread method for measuring trace surface metal contamination on semiconductor substrates. It is estimated that approximately 100 TXRF instruments are in use in the semiconductor industry worldwide, and approximately half that for residue analysis in analytical laboratories. TXRF instrumentation is available today for reaching detection limits of the order of 109 atoms/cm2. This review emphasizes some of the more recent developments in TXRF for trace analysis, in particular with the use of synchrotron x-ray sources (SR-TXRF). There is some promise of reaching 107 atoms/cm2 detection limits for surface analysis of semiconductor substrates.

Silicon Surface Metal Contamination Measurements using Grazing-Emission XRF Spectrometry

1997 ◽  
Vol 477 ◽  
Author(s):  
S. De Gendt ◽  
K. Kenis ◽  
M. Baeyens ◽  
P. W. Mertens ◽  
M. M. Heyns ◽  
...  
Keyword(s):  
Metal Contamination ◽  
Silicon Surface ◽  
Silicon Wafers ◽  
Total Reflection ◽  
Surface Contamination ◽  
Fluorescence Spectrometry ◽  
Fluorescence Technique ◽  
Light Elements ◽  
X Ray ◽  
Surface Metal

ABSTRACTGrazing-Emission X-Ray Fluorescence Spectrometry (GEXRF) is a new analytical X-ray fluorescence technique, which like TXRF takes advantage of the total-reflection phenomenon. The main advantage of GEXRF over TXRF is its sensitivity towards light elements. This paper presents straight GEXRF and VPD-DC-GEXRF analysis results for Na, Mg, Al, K and Ca surface contamination on silicon wafers.

Txrf Semiconductor Applications

1993 ◽  
Vol 37 ◽  
pp. 565-575 ◽  
Author(s):  
R. S. Hockett
Keyword(s):  
Synchrotron Radiation ◽  
Chemical Analysis ◽  
Surface Analysis ◽  
Semiconductor Industry ◽  
New Technology ◽  
Silicon Wafers ◽  
Total Reflection ◽  
Semiconductor Processing ◽  
X Ray ◽  
Planar Silicon

This is a review of Total reflection X-Ray Fluorescence (TXRF) applications for semiconductors. This review is limited to surface analysis of contamination for semiconductors and does not include chemical analysis in semiconductor processing. TXRF for surface analysis is a relatively new technology. One of the first publications occurred in 1986 using synchrotron radiation. Publications using commercially available TXRF instruments for semiconductor applications began in 1988. Today there are on the order of 100 TXRF instruments worldwide in the semiconductor industry. Since 1988 there have been about 100 publications in this field, but this number does not include numerous abstracts and publications in Japan where the majority of the commercial instruments are found today. The commercial instruments were developed for the primary application of characterizing the cleaning of planar silicon wafers, however, numerous unforeseen applications were developed by users and many of those applications are reported here. In essence TXRF has much broader application today in the semiconductor industry than supporting the cleaning of silicon wafers.

Update On Synchrotron Radiation TXRF: New Results

1998 ◽  
Vol 524 ◽  
Author(s):  
S. Brennan ◽  
P. Pianetta ◽  
S. Ghosh ◽  
N. Takaura ◽  
C. Wiemer ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Total Reflection ◽  
Synchrotron Source ◽  
X Ray ◽  
Non Destructive

ABSTRACTSynchrotron-based total-reflection x-ray fluorescence(SR-TXRF) has been developed as a leading technique for measuring wafer cleanliness. It holds advantages over other techniques in that it is non-destructive and allows mapping of the surface. The highest sensitivity observed thus far is 3x108 atoms/cm 2 (- 3fg) for 1000 second count time. Several applications of SR-TXRF are presented which take advantage of the energy tunability of the synchrotron source or the mapping capability.

Multi-elemental analysis of produced water by synchrotron radiation total reflection X-ray fluorescence

Talanta ◽  
2008 ◽  
Vol 74 (5) ◽  
pp. 1231-1235 ◽  
Author(s):  
P.M. Pimentel ◽  
M.J. Anjos ◽  
D.M.A. Melo ◽  
M.A.F. Melo ◽  
L.M. Gonçalves Jr. ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Elemental Analysis ◽  
Produced Water ◽  
Total Reflection ◽  
X Ray
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