High Quality Oxide Film Formation by 02 Cluster Ion Assisted Deposition Technique

1997 ◽  
Vol 504 ◽  
Author(s):  
J. Matsuo ◽  
W. Qin ◽  
M. Akizuki ◽  
T. Yodoshi ◽  
I. Yamada
Keyword(s):  
Kinetic Energy ◽  
Oxide Film ◽  
Film Formation ◽  
Ion Beam ◽  
Ion Beams ◽  
Flat Panel Display ◽  
Low Resistivity ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Oxygen Cluster

ABSTRACTA new oxide film formation technique using gas-cluster ion beams has been developed. 02 cluster ions were used to irradiate during the evaporation of metal atoms, and PbOx and In203 films were grown. At the acceleration voltages above 5 kV, polycrystalline PbOx films preferentially oriented to (111) were obtained. A significant smoothing effect was observed with an acceleration voltage as low as 1 kV. An average surface roughness of 0.9 nm was obtained at 7 kV. Oxygen cluster ion beams are also utilized to grow In203 films, which are widely used as conductive-transparent films in flat panel display. In203 was deposited on glass or silicon substrates with simultaneous irradiation with an oxygen cluster ion beam. Highly transparent (80%) and low resistivity (<4×10−4 Ωcm) films were obtained with 7keV oxygen cluster ion beams. Kinetic energy of above 3keV is necessary to obtain low resistivity films. These results clearly indicate that the kinetic energy of the cluster is effectively used to enhance oxidation on the surface without radiation damage, in spite of the high acceleration voltages.

Generation of O2 and metalorganic cluster ion beams and its application to low-temperature thin oxide film formation

1996 ◽  
Vol 217-218 ◽  
pp. 78-81 ◽  
Author(s):  
M. Akizuki ◽  
J. Matsuo ◽  
M. Harada ◽  
S. Ogasawara ◽  
A. Doi ◽  
...  
Keyword(s):  
Low Temperature ◽  
Oxide Film ◽  
Film Formation ◽  
Ion Beams ◽  
Thin Oxide Film ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Thin Oxide

Apatite-Forming Ability of Polymer Substrates Irradiated by Oxygen Cluster Ion Beams

2007 ◽  
pp. 111-114
Author(s):  
Masakazu Kawashita ◽  
Satomi Itoh ◽  
Kazunori Miyamoto ◽  
Rei Araki ◽  
Gikan H. Takaoka
Keyword(s):  
Ion Beams ◽  
Polymer Substrates ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Oxygen Cluster

High rate etching of GaAs and GaP by gas cluster ion beams

2003 ◽  
Vol 792 ◽  
Author(s):  
Masahiro Nagano ◽  
Shingo Houzumi ◽  
Noriaki Toyoda ◽  
Susumu Yamada ◽  
Shirabe Akita ◽  
...  
Keyword(s):  
Cluster Size ◽  
Ion Beam ◽  
Ion Beams ◽  
High Rate ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
New Processing ◽  
Gas Cluster Ion Beam ◽  
Ar Gas ◽  
Sputtering Yields

ABSTRACTGas cluster ion beam (GCIB) techniques have recently been proposed as new processing methods. We have been investigating the characteristics of GCIB techniques through sputtering GaAs and GaP by Ar gas cluster ion beams as a function of cluster size and acceleration energy. The Ar cluster size was selected by a magnetic spectrometer, and was obtained from the mass spectra measured by a time of flight mass spectrometer. The average sputtering yields of GaAs and GaP were 0–47 and 0–66 atoms/ion for 5–30 k V, respectively. The sputtering yields of GaAs and GaP were higher than those of an Ar monomer ion.

Secondary Ion Mass Spectrometry with Gas Cluster Ion Beams

2000 ◽  
Vol 647 ◽  
Author(s):  
Noriaki Toyoda ◽  
Jiro Matsuo ◽  
Takaaki Aoki ◽  
Shunichi Chiba ◽  
Isao Yamada ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Ion Beam ◽  
Md Simulations ◽  
Ion Beams ◽  
Cluster Ions ◽  
Ion Mass Spectrometry ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Secondary Ion

AbstractSecondary Ion Mass Spectrometry (SIMS) with Gas Cluster Ion Beams (GCIB) was studied with experiments and molecular dynamics (MD) simulations to achieve a high-resolution depth profiling. For this purpose, it is important to prevent both ion-mixing and the surface roughening due to energetic ions. As the Ar cluster ion beam shows surface smoothing effects and high secondary-ion yield in the low-energy regime, the cluster ion beam would be suitable for the primary ion beam of SIMS. From MD simulations of Ar cluster ion impact on a Si substrate, the ion-mixing is heavier than for Ar monomer ions at the same energy per atom, because the energy density at the impact point by clusters is extremely high. However, the sputtering yields with Ar cluster ions are one or two orders of magnitude higher than that with Ar monomer ions at the same energy per atom. Comparing at the ion energy where the ion-mixing depths are the same by both cluster and monomer ion impacts, cluster ions show almost ten times higher sputtering yield than Ar monomer ions. Preliminary experiment was done with a conventional SIMS detector and a mass resolution of several nm was achieved with Ar cluster ions as a primary ion beam.

High-speed Processing with Reactive Cluster Ion Beams

2004 ◽  
Vol 843 ◽  
Author(s):  
Toshio Seki ◽  
Jiro Matsuo
Keyword(s):  
High Speed ◽  
Ion Beam ◽  
Beam Current ◽  
Ion Beams ◽  
High Rate ◽  
Cluster Ions ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Sputtering Yield ◽  
Reactive Cluster

ABSTRACTCluster ion beam processes can produce high rate sputtering with low damage in comparison with monomer ion beam processes. Especially, it is expected that extreme high rate sputtering can be obtained using reactive cluster ion beams. Reactive cluster ion beams, such as SF6, CF4, CHF3, and CH2F2, were generated and their cluster size distributions were measured using Time-of-Flight (TOF) method. Si substrates were irradiated with the reactive cluster ions at the acceleration energy of 5–65 keV. Each sputtering yield was increased with acceleration energy and was about 1000 times higher than that of Ar monomer ions. The sputtering yield of SF6 cluster ions was about 4600 atoms/ion at 65 keV. With this beam, 12 inches wafers can be etched 0.5 μm per minute at 1 mA of beam current. The TOF measurement showed that the size of SF6 cluster was about 550 molecules and the number of fluorine atoms in a SF6 cluster was about 3300. If the sputtered product was SiF, the yield has to be less than 3300 atoms/ion. These results indicate that the reactive cluster ions etch targets not only chemically, but also physically. This high-speed processing with reactive cluster ion beam can be applied to fabricate nano-devices.

scholarly journals Large Molecular Cluster Formation from Liquid Materials and Its Application to ToF-SIMS

2021 ◽  
Vol 5 (2) ◽  
pp. 10
Author(s):  
Kousuke Moritani ◽  
Shogo Nagata ◽  
Atsushi Tanaka ◽  
Kosuke Goto ◽  
Norio Inui
Keyword(s):  
Aspartic Acid ◽  
Ion Beam ◽  
Cluster Formation ◽  
Chemical Properties ◽  
Ion Beams ◽  
Chemical Effect ◽  
Molecular Cluster ◽  
Tof Sims ◽  
Cluster Ion Beams ◽  
Cluster Ion

Since molecular cluster ion beams are expected to have various chemical effects, they are promising candidates for improving the secondary ion yield of Tof-SIMS. However, in order to clarify the effect and its mechanism, it is necessary to generate molecular cluster ion beams with various chemical properties and systematically examine it. In this study, we have established a method to stably form various molecular cluster ion beams from relatively small amounts of liquid materials for a long time by the bubbling method. Furthermore, we applied the cluster ion beams of water, methanol, methane, and benzene to the primary beam of SIMS and compared the molecular ion yields of aspartic acid. The effect of enhancing the yields of [M+H]+ ion of aspartic acid was found to be the largest for the water cluster and small for the methane and benzene clusters. These results indicate that the chemical effect contributes to the desorption/ionization process of organic molecules by the molecular cluster ion beam.

scholarly journals Apatite Deposition on Polymer Substrates Irradiated by Oxygen Cluster Ion Beams

2006 ◽  
Vol 114 (1325) ◽  
pp. 77-81 ◽  
Author(s):  
Masakazu KAWASHITA ◽  
Hiroshi SHIMATANI ◽  
Satomi ITOH ◽  
Rei ARAKI ◽  
Gikan H. TAKAOKA
Keyword(s):  
Ion Beams ◽  
Polymer Substrates ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Apatite Deposition ◽  
Oxygen Cluster

High-speed Processing with Cluster Ion Beams

2003 ◽  
Vol 792 ◽  
Author(s):  
Toshio Seki ◽  
Jiro Matsuo
Keyword(s):  
High Speed ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Ion Beams ◽  
High Rate ◽  
Cluster Ions ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Sputtering Yield ◽  
Reactive Cluster

ABSTRACTCluster ion beam processes can produce high rate sputtering with low damage in comparison with monomer ion beam processes. Especially, it is expected that extreme high rate sputtering can be obtained using reactive cluster ion beams. High current SF6 cluster ion beams were recently obtained with new modifications in the basic cluster ion beam technique. The cluster size distribution was measured with Time-of-Flight (TOF) method and the mean size of cluster was about 500 molecules. Si substrates were irradiated with SF6 cluster ions at the acceleration energy of 5–45 keV. Sputtering yield with SF6 cluster ions was increased with acceleration energy and was about 2300 atoms/ion at 45 keV. The sputtering yield was about 1000 times higher than that of Ar monomer ions and was also higher than that of Ar cluster ions. It was found that reactive sputtering occurred with SF6 cluster ion irradiation. These results indicate that high-speed fabrication can be realized with reactive cluster ion irradiation at high energy.

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