RAMAN SCATTERING AND X-RAY DIFFRACTION CHARACTERIZATION OF AMORPHOUS SEMICONDUCTOR MULTILAYER INTERFACES
Keyword(s):
X Ray
◽
AbstractIn the present study, Raman spectroscopy (RS) and x-ray diffraction have been used to characterize semiconductor multilayer interfaces. A model for Raman spectra of multilayers is developed and applied to the specific case of the interfaces of a-Si/a-Ge multilayers. Quantification of the ‘blurring’ of interfaces is possible because RS is capable of directly ‘counting’ the total number of chemical bonds of a given type in the film. Multilayers, prepared by various deposition techniques, are compared. Several a-Si/a-Ge multilayers deposited by UHV evaporation (MBD) exhibit exceptionally sharp interfaces (intermixing width <l.0Å) and regular periodicities.
1999 ◽
Vol 14
(2)
◽
pp. 442-446
◽
2014 ◽
Vol 989-994
◽
pp. 130-133
Keyword(s):
2001 ◽
Vol 32
(5)
◽
pp. 839-845
◽
Keyword(s):