Crystal Growth Mechanisms and Kinetics

1985 ◽  
Vol 57 ◽  
Author(s):  
M. E. Glicksman ◽  
M. E. Selleck

AbstractThe scientific contributions by David Turnbull and his co-workers toward understanding crystal growth span over 35 years from the late 1940's to the present. Turnbull's early attempt (1950) to correlate interfacial energies derived from droplet supercooling measurements with other thermochemical data still provides a significant data base for estimating such energies in a variety of materials. His work with Hillig in 1956 on quantification of the screw dislocation mechanism for interfacial molecular attachment remains as a predictive theory for defect-assisted growth of faceted, and therefore kinetically hindered, interfaces. The Hillig-Turnbull screw dislocation mechanism is now ranked among such notable kinetic models for crystal growth as the Wilson-Frenkel random attachment theory and the nucleationlimited layer spreading models of Burton, Cabrera, and Frank. Turnbull's contributions and interest in elucidating crystal growth kinetics have continued throughout his long and productive career, as evidenced by his recent work with Coriell (1982) on estimates of collision limited rapid crystal growth in highly supercooled transition metals. Progress in unraveling the kinetic contributions of interfacial attachment from those of heat and solute transport will also be reviewed to provide a current context of Professor Turnbuli's contributions to the field of rapid crystallization.

1993 ◽  
Vol 321 ◽  
Author(s):  
Riccardo Reitanot ◽  
Patrick M. Smith ◽  
Michael J. Aziz

ABSTRACTAt the high growth rates accessible during pulsed-laser induced melting and solidification and explosive crystallization, crystal growth kinetics are dominated not by equilibrium thermodynamics, but by the atomistic mechanisms by which crystallization proceeds. These Mechanisms can be probed by testing the predictions of solute trapping models based on various crystal/Melt interface structures against Measurements. We have measured the dependence of solute trapping of several group III, IV, and V elements in silicon on both interface orientation and crystallization speed. The Aperiodic Stepwise Growth Model of Goldman and Aziz accurately fits both the velocity and orientation dependence of the solute trapping observed in these systems. The success of the model implies a ledge structure for the crystal/Melt interface and a step-flow mechanism for crystal growth. In addition, we have observed an empirical inverse correlation between the two free parameters (“diffusive speeds”) in this model and the equilibrium solute partition coefficient of a system. This correlation may be used to estimate values of the diffusive speeds for other systems in which solute trapping has not been or cannot be Measured.


2009 ◽  
Vol 9 (6) ◽  
pp. 2794-2800 ◽  
Author(s):  
Dale L. Schruben ◽  
Julien A. Stephanus ◽  
Maria Elena Gonzalez

2012 ◽  
Vol 14 (3) ◽  
pp. 380-388 ◽  
Author(s):  
Ye Sun ◽  
Lei Zhu ◽  
Tian Wu ◽  
Ting Cai ◽  
Erica M. Gunn ◽  
...  

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