Pulsed Laser Deposition of Superconductor/Ferromagnetic YBa2Cu3Oy/SrTiO3/La2/3Sr1/3MnO3 Heterostructures

1999 ◽  
Vol 574 ◽  
Author(s):  
V. Trtík ◽  
F. Sánchez ◽  
C. Ferrater ◽  
M. Varela ◽  
L. Fábrega ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Complete Analysis ◽  
Force Microscopy ◽  
Atomic Force ◽  
Strip Geometry ◽  
Droplet Density ◽  
Scanning Electron ◽  
Deposition Conditions

AbstractYBa2Cu3Oy/SrTiO3/La2/3Sr1/3MnO3 heterostructures have been deposited on LaAlO3(001) and SrTiO3(001) substrates by pulsed laser deposition. First, the influence of deposition conditions on crystallinity and morphology of single LSMO films was examined. Results were used for preparation of heterostructures in tri-layer and cross-strip geometry. Cross-strip geometry was defined by direct shadow mask patterning. Different characterization techniques have been used to determine and correlate the heterostructure properties. A complete analysis of the crystal structure has been carried out with a four-circle difractometer. Morphology has been studied by scanning electron microscopy and atomic force microscopy in order to determine surface roughness and droplet density. Basic electrical properties of films have been determined.

Surface morphology, bioactivity, and antibacterial studies of pulsed laser deposited hydroxyapatite coatings on Stainless Steel 254 for orthopedic implant applications

2016 ◽  
Vol 233 (2) ◽  
pp. 120-127 ◽  
Author(s):  
Ashish Das ◽  
Mukul Shukla
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Orthopedic Implant ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Hydroxyapatite Coatings ◽  
Scanning Electron

Coating of hydroxyapatite using the pulsed laser deposition technique, on medical grade UNS S31254 stainless steel (254SS), to yield a biomaterial for potential orthopedic implant applications, is unreported so far in the literature. In this paper, the pulsed laser deposition process was used to improve the physiological response of 254SS. The surface morphology of the deposited hydroxyapatite coatings was characterized using scanning electron microscopy and atomic force microscopy, while the phase composition of the deposited hydroxyapatite coatings was determined using the X-ray diffraction method. The thickness and adhesive strength of the hydroxyapatite coatings were determined using an ellipsometer and a tensometer, respectively. The antibacterial efficacy of the deposited hydroxyapatite coatings was confirmed using the modern technique of fluorescence-activated cell sorting. Finally, the bioactivity of hydroxyapatite coatings was investigated by conducting immersion test in simulated body fluid environment. The scanning electron microscopy and atomic force microscopy results revealed higher (∼8 nm) average surface roughness, which is likely to facilitate better osseointegration. X-ray diffraction analysis confirmed that postdeposition annealing is essential to achieve the desired crystallinity and uniformity of coatings. Tensile pull-out tests confirmed adhesive strength of hydroxyapatite coatings beyond the standard expected values. Immersion tests inferred high bioactivity of pulsed laser deposition hydroxyapatite coatings. The promising results obtained in this research signify the potential application of hydroxyapatite coatings in orthopedic implants.

Cross-Sectional Nanoindentation of Alumina Thin Films Deposited by Pulsed Laser Deposition Process

2006 ◽  
Author(s):  
Sudheer Neralla ◽  
Sergey Yarmolenko ◽  
Dhananjay Kumar ◽  
Devdas Pai ◽  
Jag Sankar
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
High Hardness ◽  
Deposition Process ◽  
Laser Deposition ◽  
Cross Sectional ◽  
Adhesion Properties ◽  
Force Microscopy ◽  
Atomic Force

Alumina is a widely used ceramic material due to its high hardness, wear resistance and dielectric properties. The study of phase transformation and its correlation to the mechanical properties of alumina is essential. In this study, interfacial adhesion properties of alumina thin films are studied using cross-sectional nanoindentation (CSN) technique. Alumina thin films are deposited at 200 and 700 °C, on Si (100) substrates with a weak Silica interface, using pulsed laser deposition (PLD) process. Effect of annealing on the surface morphology of the thin films is studied using atomic force microscopy. Xray diffraction studies revealed that alumina thin films are amorphous in nature at 200 °C and polycrystalline with predominant gamma alumina phase at 700 °C.

Growth of Carbon Nanotubes on Si Substrate Using Fe Catalyst Produced by Pulsed Laser Deposition

2008 ◽  
Vol 8 (11) ◽  
pp. 5748-5752
Author(s):  
S. Krishnamurthy ◽  
T. Donnelly ◽  
N. McEvoy ◽  
W. Blau ◽  
J. G. Lunney ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Pulsed Laser Deposition ◽  
Chemical Vapour ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Force Microscopy ◽  
Fe Catalyst ◽  
Atomic Force ◽  
Catalytic Nanoparticles ◽  
Size Controlled

We report the growth of carbon nanotubes on the size controlled iron catalytic nanoparticles. The nanotubes were grown by thermal chemical vapour deposition (CVD) in the temperature range 600–850 °C. The Fe films were deposited on silicon by pulsed laser deposition in vacuum. Atomic force microscopy measurements were performed on the catalytic nanoparticles. The topography of the catalytic nanoparticles shows the homogenous distribution of Fe catalyst. We observe the nanotubes are produced only at temperatures between 650 and 800 °C, and within this narrow temperature regime the yield of nanotubes reaches a maximum around 750 °C and then declines. Raman measurements illustrate a high G/D peak ratio indicating good nanotube quality. By further defining the size of the catalyst the diameter of these carbon nanotubes can be controlled.

Influence of Post Growth Annealing on the Optical Properties of Gallium Nitride Films Grown by Pulsed Laser Deposition

2012 ◽  
Vol 1432 ◽  
Author(s):  
M. Baseer Haider ◽  
M. F. Al-Kuhaili ◽  
S. M. A. Durrani ◽  
Imran Bakhtiari
Keyword(s):  
Thin Films ◽  
Gallium Nitride ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Nitrogen Atmosphere ◽  
Laser Deposition ◽  
Optical Measurements ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Abstract:Gallium nitride thin films were grown by pulsed laser deposition. Subsequently, post-growth annealing of the samples was performed at 400, and 600 oC in the nitrogen atmosphere. Surface morphology of the as-grown and annealed samples was performed by atomic force microscopy, surface roughness of the films improved after annealing. Chemical analysis of the samples was performed using x-ray photon spectroscopy, stoichiometric Gallium nitride thin films were obtained for the samples annealed at 600 oC. Optical measurements of the samples were performed to investigate the effect of annealing on the band gap and optical constants the films.

Stability and Structural Characterization of Epitaxial NdNiO3 Films Grown by Pulsed Laser Deposition

2000 ◽  
Vol 658 ◽  
Author(s):  
Trong-Duc Doan ◽  
Cobey Abramowski ◽  
Paul A. Salvador
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Force Microscopy ◽  
Atomic Force ◽  
Monoclinic Distortion

ABSTRACTThin films of NdNiO3 were grown using pulsed laser deposition on single crystal substrates of [100]-oriented LaAlO3 and SrTiO3. X-ray diffraction and reflectivity, scanning electron microscopy, and atomic force microscopy were used to characterize the chemical, morphological and structural traits of the thin films. Single-phase epitaxial films are grown on LaAlO3 and SrTiO3 at 625°C in an oxygen pressure of 200 mTorr. At higher temperatures, the films partially decompose to Nd2NiO4 and NiO. The films are epitaxial with the (101) planes (orthorhombic Pnma notation) parallel to the substrate surface. Four in-plane orientational variants exist that correspond to the four 90° degenerate orientations of the film's [010] with respect to the in-plane substrate directions. Films are observed to be strained in accordance with the structural mismatch to the underlying substrate, and this leads, in the thinnest films on LaAlO3, to an apparent monoclinic distortion to the unit cell.

scholarly journals Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films

2018 ◽  
Vol 9 ◽  
pp. 686-692 ◽  
Author(s):  
Daiki Katsube ◽  
Hayato Yamashita ◽  
Satoshi Abo ◽  
Masayuki Abe
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Metal Oxide ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Film Surface ◽  
Laser Deposition ◽  
Combined System ◽  
Force Microscopy ◽  
Atomic Force

We have designed and developed a combined system of pulsed laser deposition (PLD) and non-contact atomic force microscopy (NC-AFM) for observations of insulator metal oxide surfaces. With this system, the long-period iterations of sputtering and annealing used in conventional methods for preparing a metal oxide film surface are not required. The performance of the combined system is demonstrated for the preparation and high-resolution NC-AFM imaging of atomically flat thin films of anatase TiO2(001) and LaAlO3(100).

Surface Morphology Of PZT Thin Films Prepared By Pulsed Laser Deposition

2000 ◽  
Vol 617 ◽  
Author(s):  
Masaaki Yamazato ◽  
Masamitsu Nagano ◽  
Tomoaki Ikegami ◽  
Kenji Ebihara
Keyword(s):  
Surface Morphology ◽  
Pulsed Laser Deposition ◽  
Ferroelectric Properties ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Grid Electrode ◽  
Force Microscopy ◽  
Atomic Force ◽  
Tan Δ

AbstractFerroelectric PbZr0.52Ti0.48O3(PZT)/YBa2 Cu3O7−x(YBCO) heterostructures on MgO substrate were fabricated by KrF pulsed laser deposition. The grid electrode was set between a substrate and target for improvement of surface morphology. The typical PZT layer had excellent ferroelectric properties; remnant polarization of 39 µC/cm2, coercive electric field of 41 kV/cm, loss tan δ=0.04, and dielectric constant of 950. X-ray diffraction results show that the films had highly c-axis and (a, b) plane orientation. The full widths at half-maximum (FWHM) of rocking curves was decreased with increasing the applied voltage of grid electrode. Atomic force microscopy (AFM) images of PZT layer showed that the film morphology was improved by using a grid electrode.

Observation of the effects of Bi-deficiency on ferroelectric and electrical properties in Bi(1+x)FeO3/La0.65Sr0.35MnO3 heterostructures via atomic force microscopy

RSC Advances ◽  
2016 ◽  
Vol 6 (116) ◽  
pp. 115039-115045 ◽  
Author(s):  
Qing Liu ◽  
Jieling Zhang ◽  
Ling Wei ◽  
Weifeng Zhang
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Force Microscopy ◽  
Atomic Force

Bi(1+x)FeO3 thin films with different Bi contents (x = 0%, 5%, and 10%) were grown on (001) SrTiO3 substrates with La0.65Sr0.35MnO3 (LSMO) buffered layers via pulsed laser deposition.

scholarly journals Pulsed-Laser Deposition of Titanium Nitride

1995 ◽  
Vol 388 ◽  
Author(s):  
Wenbiao Jiang ◽  
M. Grant Norton ◽  
J. Thomas Dickinson ◽  
N.D. EVANS
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Coincident Site Lattice ◽  
Structural Similarity ◽  
Laser Deposition ◽  
Tin Films ◽  
Force Microscopy ◽  
Atomic Force ◽  
Substrate Temperatures ◽  
Oriented Single Crystal

AbstractThe pulsed-laser deposition technique has been used to form thin films of TiN on (100)-oriented single crystal substrates of silicon and rocksalt. Using atomic force microscopy, it was revealed that TiN films grown on silicon at substrate temperatures ranging from 50°C to 500°C were extremely smooth—the mean roughness being ~ 0.2 nm. Thin TiN films deposited on freshly cleaved NaCl were found to be epitaxial at substrate temperatures as low as 50°C. Epitaxy in this latter system is believed to be due to the structural similarity between film and substrate and the almost exact 4:3 coincident site lattice.

scholarly journals Electrochemical Response of Platinum Ultrathin Layer Formed by Pulsed Laser Deposition

2011 ◽  
Vol 2011 ◽  
pp. 1-6 ◽  
Author(s):  
Takeshi Ito ◽  
Satoru Kaneko ◽  
Masayuki Kunimatsu ◽  
Yasuo Hirabayashi ◽  
Masayasu Soga ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Photoelectron Spectroscopy ◽  
Low Cost ◽  
Pulsed Laser ◽  
Metal Electrode ◽  
Laser Deposition ◽  
Force Microscopy ◽  
Atomic Force ◽  
Microscopy Images ◽  
Ultrathin Layer

Ultrathin layer of platinum (ULPt) was deposited on glassy carbon (GC) substrate by using pulsed laser deposition (PLD) method, and electrochemical properties of the ULPt were discussed. The deposition was simply performed at room temperature with short deposition time. Atomic force microscopy and scanning electron microscopy images showed the flat surface of the ULPt. X-ray photoelectron spectroscopy (XPS) characterized the ULPt in the Pt(0) state, and biding energy of ULPt was positively shifted. These results indicated that nanostructure of Pt thin layer was formed. The electrochemical activity of the prepared ULPt on GC substrate was superior to a bulk Pt electrode regarding the potential and the magnitude of current on oxidizing hydrogen peroxide. This fast and easily prepared low-cost electrode had the potential to replace a conventional bulk metal electrode.

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