Simulation of 3D Films Deposited by Glancing Angle Deposition Using 3D-Films

2000 ◽  
Vol 616 ◽  
Author(s):  
T. Smy ◽  
D. Vick ◽  
M. J. Brett ◽  
S. K. Dew ◽  
A. T. Wu ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Three Dimensional ◽  
Thin Film Deposition ◽  
Glancing Angle Deposition ◽  
Film Deposition ◽  
Porous Thin Films ◽  
Glancing Angle ◽  
Memory Resources ◽  
Angle Deposition

AbstractA new fully three dimensional (3D) ballistic deposition simulator 3D-FILMS has been developed for the modeling of thin film deposition and structure. The simulator may be implemented using the memory resources available to workstations. In order to illustrate the capabilities of 3D-FILMS, we apply it to the growth of engineered porous thin films produced by the technique of GLancing Angle Deposition (GLAD).

Thin Film Microstructure Control Using Glancing Angle Deposition by Sputtering

1999 ◽  
Vol 14 (4) ◽  
pp. 1197-1199 ◽  
Author(s):  
J. C. Sit ◽  
D. Vick ◽  
K. Robbie ◽  
M. J. Brett
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Incidence Angle ◽  
Porous Titanium ◽  
Glancing Angle Deposition ◽  
Nanometer Scale ◽  
Glancing Angle ◽  
Deposition By Sputtering ◽  
Titanium Thin Films ◽  
Angle Deposition

Thin films with microstructures controlled on a nanometer scale have been fabricated using a recently developed process called glancing angle deposition (GLAD) which combines oblique angle evaporation with controlled substrate motion. Critical to the production of GLAD thin films is the requirement for a narrow angular flux distribution centered at an oblique incidence angle. We report here recent work with low-pressure, long-throw sputter deposition with which we have succeeded in fabricating porous titanium thin films possessing “zig-zag,” helical, and “pillar” microstructures, demonstrating microstructural control on a level consistent with evaporated GLAD. The use of sputtering for GLAD simplifies process control and should enable deposition of a broader range of thin film materials.

scholarly journals 2D and 3D Analyses of Metal Oxide Thin Films Examined by Atomic Force Microscope

2015 ◽  
Vol 773-774 ◽  
pp. 716-719
Author(s):  
Mokhter Faezahana ◽  
Nayan Nafarizal ◽  
Jia Wei Low ◽  
Che Ani Norhidayah ◽  
Mohd Zainizan Sahdan ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Metal Oxide ◽  
Three Dimensional ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films ◽  
Atomic Force ◽  
Measured Sample

Atomic force microscope (AFM) is a useful tool to capture the two- and three-dimensional image of height and size of nanostructured thin film. It operate by measuring the forces between a sharp tip and surface of the measured sample. In addition, AFM is equipped with powerful software for image processing to interpret experimental results in detail. For example, by using the height and scanning length parameters of measured sample, average roughness and root mean square roughness can be evaluated. In the present works, the effect of image flattening process toward the surface roughness and surface fluctuations of metal oxide thin films will be presented. Set of samples were prepared by magnetron sputtering deposition and sol-gel coating techniques. In gas sensor industries using metal oxide thin film, surface roughness of metal oxide thin films are very important in order to improve the sensitivity and respond time of gas sensor. Therefore, optimization of thin film deposition and characterization are very important. The correlation between the three-dimensional image and thin film deposition and image processing parameters will also be presented.

Nanoindentation of Microspring Thin Films

2000 ◽  
Vol 657 ◽  
Author(s):  
Mary W. Seto ◽  
Brian Dick ◽  
Michael J. Brett
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Glancing Angle Deposition ◽  
Nanometer Scale ◽  
Deposition Technique ◽  
Porous Thin Films ◽  
Glancing Angle ◽  
Scale Control ◽  
Angle Deposition ◽  
Insight Into

ABSTRACTPorous thin films with helical microstructures were fabricated with the Glancing Angle Deposition technique. These films consisted of arrays of “microsprings” whose geometries could be engineered with nanometer scale control. Some of the mechanical properties of these helically structured films were studied with a nanoindentation technique. Several microscopic “springbed” films were tested over a range of forces using a spherical indenter tip. The geometries of the microsprings were varied, and a number of different materials were used to fabricate these films, which were typically a few micrometers thick. Slanted post arrays, resembling micro-cantilevers, were also subjected to nanoindentation tests. Results of initial experiments, theory, and simulations show that these microstructures behave in a manner analogous to macroscopic springs and cantilevers, and may offer some insight into how materials behave at the microscale.

Fabrication of Helically Perforated Thin Films

2000 ◽  
Vol 636 ◽  
Author(s):  
K.D. Harris ◽  
K.L. Westra ◽  
M.J. Brett
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Chemical Etching ◽  
Glancing Angle Deposition ◽  
Glass Substrates ◽  
Small Pitch ◽  
Glancing Angle ◽  
Angle Deposition ◽  
Template Material

AbstractUsing glancing angle deposition and templating techniques, we have fabricated a number of unique thin film microstructures. Engineered columnar thin films having the inverse of the desired structure (i.e., arrays of helices or chevrons) were first deposited by glancing angle deposition. These films were then filled with a solution of the desired material, and allowed to cure. The template material was then removed by chemical etching, leaving a perforated thin film. Such films have been produced of photoresist and spin-on-glass, on both silicon and glass substrates. The perforations have taken the form of chevrons and helices of large and small pitch, and have been arranged in both random and periodic (1μm spacing) arrays.

Ultrahigh vacuum glancing angle deposition system for thin films with controlled three-dimensional nanoscale structure

2004 ◽  
Vol 75 (4) ◽  
pp. 1089-1097 ◽  
Author(s):  
Kevin Robbie ◽  
Gisia Beydaghyan ◽  
Tim Brown ◽  
Cory Dean ◽  
Jonathan Adams ◽  
...  
Keyword(s):  
Thin Films ◽  
Three Dimensional ◽  
Ultrahigh Vacuum ◽  
Glancing Angle Deposition ◽  
Glancing Angle ◽  
Nanoscale Structure ◽  
Angle Deposition

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

Phenethylammonium bismuth halides: from single crystals to bulky-organic cation promoted thin-film deposition for potential optoelectronic applications

2019 ◽  
Vol 7 (36) ◽  
pp. 20733-20741 ◽  
Author(s):  
Mehri Ghasemi ◽  
Miaoqiang Lyu ◽  
Md Roknuzzaman ◽  
Jung-Ho Yun ◽  
Mengmeng Hao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Roughness ◽  
Single Crystals ◽  
Organic Cation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optoelectronic Applications ◽  
Excellent Stability

The phenethylammonium cation significantly promotes the formation of fully-covered thin-films of hybrid bismuth organohalides with low surface roughness and excellent stability.

scholarly journals Structural, chemical and magnetic properties of nickel vertical posts obtained by glancing angle deposition technique

2017 ◽  
Vol 49 (1) ◽  
pp. 73-79
Author(s):  
Jelena Potocnik ◽  
Milos Nenadovic ◽  
Bojan Jokic ◽  
Maja Popovic ◽  
Zlatko Rakocevic
Keyword(s):  
Thin Film ◽  
Magnetic Properties ◽  
Photoelectron Spectroscopy ◽  
Glancing Angle Deposition ◽  
Deposition Technique ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Magneto Optical Kerr Effect ◽  
Angle Deposition

In this work, Glancing Angle Deposition technique was used for obtaining nanostructured nickel thin film with vertical posts on glass substrate which was positioned 75 degrees with respect to the substrate normal and rotated with a suitable constant speed. The obtained nickel thin film was characterized by Scanning Electron Microscopy, Atomic Force Microscopy and X-ray Photoelectron Spectroscopy. It was found that the deposited thin film consists of 94.0 at.% of nickel. Magnetic properties of the deposited thin film were determined by Magneto-Optical Kerr Effect Microscopy. According to the obtained coercivity values, it can be concluded that the nickel thin film shows uniaxial magnetic anisotropy.

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