Nano-Creep Test for Anatase Polycrystalline Films

2001 ◽  
Vol 695 ◽  
Author(s):  
Hironori Sugata ◽  
Shigeo Ohshio ◽  
Hidetoshi Saitoh

ABSTRACTWe introduce an analytical technique for time-dependent deformation behavior of the polycrystalline films using a nano-indenter. This technique permits evaluation of structural deformation of the nanometer scale of the thin films. In this paper, good accuracy conditions were determined to measure deformation behavior of the polycrystalline films. The polycrystalline films of anatase were used to investigate the grain boundary structure. We prove that the analysis of time-dependent deformation behavior is effective to investigate the structure of the polycrystalline films.

1995 ◽  
Vol 403 ◽  
Author(s):  
Krishna Rajan ◽  
Ronald Petkie

AbstractThe concept of fcc fiber texture is examined in the context of Rodrigues-Frank (R-F) representations. Using fiber texture in thin films as the basis of our analysis, it is shown that this approach when combined with grain specific determination of crystallographic orientation provides a useful means of detecting a number of texture components with relatively small grain sampling densities. The application of R-F representations is also shown to be a useful methodology to couple grain boundary structure information with microtexture data.


Author(s):  
K.H. Westmacott ◽  
U. Dahmen

The Ionized Cluster Beam (ICB) technique pioneered by Takagi and colleagues in Kyoto is an exciting new method for depositing thin films possessing novel microstructures and unusual properties, (see for example Ref. 1 for a review of recent work). These materials are of interest not only for their potential use in electronic applications but also because of their eminent suitability for fundamental high resolution studies of grain boundary structureThe HVEM's at the National Center for Electron Microscopy are employed in a complementary fashion to characterize fully the microstructure of ICB deposited Al films. In-situ annealing studies of the films are conducted in the 1.5 MeV Kratos HVEM taking advantage of its heating stage, excellent specimen chamber vacuum (10-8 torr), and high resolution video camera. The increased penetration at 1.5 MeV allows different film thicknesses of Al film to be examined as well as the regions of the foil where the silicon substrate remains backing the Al film. High resolution studies of the atomic structure of grain boundaries are performed on the 1 MeV JEOL ARM using its unique tilting stage and ability to image structures at the 0.15 nm level.


1994 ◽  
Vol 231 (1-2) ◽  
pp. 123-130 ◽  
Author(s):  
B. Kabius ◽  
J.W. Seo ◽  
T. Amrein ◽  
U. Dähne ◽  
A. Scholen ◽  
...  

2003 ◽  
Vol 42 (Part 1, No. 4A) ◽  
pp. 1738-1743 ◽  
Author(s):  
Hironori Sugata ◽  
Shigeo Ohshio ◽  
Hidetoshi Saitoh

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