scholarly journals Investigation of the Fine Structure of 5 VMC Niobium Alloy Samples After Internal Nitriding

2021 ◽  
pp. 36-44
Author(s):  
Konstantin Smirnov ◽  
Keyword(s):  
Fine Structure ◽  
Dislocation Density ◽  
Niobium Alloy ◽  
X Ray Diffraction ◽  
Internal Nitriding ◽  
X Ray

The paper considers the possibility of studying the fine structure of samples made of niobium alloy 5 VMC (grade 5B2MC-2), which underwent internal nitriding by X-ray diffraction analysis.The calculation of the dislocation density, which represents one of the parameters of the fine structure using various techniques, is shown. Its influence on the possible modes of internal nitriding is considered.

Evaluation of threading dislocation density of strained Ge epitaxial layer by high resolution x-ray diffraction

2017 ◽  
Vol 26 (12) ◽  
pp. 127309 ◽  
Author(s):  
Yuan-Hao Miao ◽  
Hui-Yong Hu ◽  
Xin Li ◽  
Jian-Jun Song ◽  
Rong-Xi Xuan ◽  
...  
Keyword(s):  
High Resolution ◽  
Dislocation Density ◽  
Epitaxial Layer ◽  
Threading Dislocation ◽  
X Ray Diffraction ◽  
X Ray ◽  
Threading Dislocation Density

Extended X-ray absorption fine-structure analysis of vacuum-deposited amorphous germanium

1989 ◽  
Vol 67 (4) ◽  
pp. 358-364 ◽  
Author(s):  
G. W. Johnson ◽  
D. E. Brodie ◽  
E. D. Crozier
Keyword(s):  
Fine Structure ◽  
Amorphous Materials ◽  
Amorphous Material ◽  
Amorphous Structure ◽  
Low Energy ◽  
X Ray Diffraction ◽  
Two Phase ◽  
Edge Structure ◽  
X Ray ◽  
Low Energy Electrons

In this study, thin films of germanium have been vacuum deposited in four regimes. Care was taken to prepare reproducible films, which required that the partial pressure of water be below 10−8 Torr during deposition (1 Torr = 133.3 Pa). First, films deposited onto substrates held during deposition at a temperature Ts that is below 473 K are amorphous. Once annealed above 423 K, their electrical conductivity and optical band gap are independent of deposition temperature and rate, and of whether or not low-energy electron irradiation of the substrate is used during deposition. This suggests that a well-defined and reproducible structure is being prepared. Second, a "precrystallization regime" is obtained when Ts is between 473 and 513 K. Extended X-ray adsorption fine-structure and X-ray diffraction confirm that this regime is a two-phase mixture of amorphous material and crystallites. Third, films deposited with Ts near 513 K, while using low-energy electrons to bombard the substrate, are amorphous, but these films have different electrical and optical properties from the films m the first regime. From this, we infer that a second well-defined amorphous structure exists. Fourth, films deposited with Ts above 513 K are polycrystalline. Extended X-ray adsorption fine-structure and X-ray adsorption near-edge structure could not distinguish between the two amorphous materials in the first and third regimes.

Differentiation of biological hydroxyapatite compounds by infrared spectroscopy, x-ray diffraction and extended x-ray absorption fine structure

2001 ◽  
Vol 90 (12) ◽  
pp. 6440-6446 ◽  
Author(s):  
E. Chassot ◽  
H. Oudadesse ◽  
J. Irigaray ◽  
E. Curis ◽  
S. Bénazeth ◽  
...  
Keyword(s):  
Fine Structure ◽  
Infrared Spectroscopy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption
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