TiNx Thin Films Deposited by Reactive Magnetron Sputtering: In-Situ Monitoring and Effect of Deposition Parameters
1995 ◽
Vol 6
(1)
◽
pp. 31-40
1991 ◽
Vol 9
(4)
◽
pp. 2442-2446
◽
2015 ◽
Vol 161
◽
pp. 26-34
◽
High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)
◽
2015 ◽
Vol 19
(2)
◽
pp. 105-112
Keyword(s):
Structure and Electrical Property of CuInS2 Thin Films Deposited by DC Reactive Magnetron Sputtering
2011 ◽
Vol 26
(12)
◽
pp. 1287-1292
◽
2011 ◽
Vol 406
(13)
◽
pp. 2658-2662
◽
2012 ◽
Vol 51
(2)
◽
pp. 02BM04
◽
Keyword(s):
2010 ◽
Vol 45
(18)
◽
pp. 4994-5001
◽