scholarly journals Reactive magnetron sputtering of tungsten disulfide (WS2−x) films: Influence of deposition parameters on texture, microstructure, and stoichiometry

2007 ◽  
Vol 101 (10) ◽  
pp. 103502 ◽  
Author(s):  
V. Weiß ◽  
S. Seeger ◽  
K. Ellmer ◽  
R. Mientus
Keyword(s):  
Magnetron Sputtering ◽  
Tungsten Disulfide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Deposition Parameters

FORMATION OF NANOCRYSTALS AND AMORPHOUS Al2O3 FILM GROWN BY REACTIVE MAGNETRON SPUTTERING

2008 ◽  
Vol 22 (24) ◽  
pp. 4217-4224 ◽  
Author(s):  
NITINAI UDOMKANA ◽  
PICHET LIMSUWAN
Keyword(s):  
Atomic Force Microscopy ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Phonon Modes ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters ◽  
Nano Size ◽  
Amorphous Al2o3

Al 2 O 3 films were deposited by reactive magnetron sputtering. As measured with Raman spectroscopy, the atomic force microscopy (AFM), nanohardness and spectrophotometer, respectively. Raman microscopy was then employed to follow their characteristics of optical and acoustic phonon modes. At the optimal sputtering time of 30 minutes, defect-induced first and second order Raman spectra were observed in the 100–900 cm-1 band, which was related to coating composition. However, at the thickness at 250, 300, 450 and 500 nm crystals of the order of nano size of α- Al 2 O 3 phase were achieved, which could be clearly identified by the presence of Raman peaks at 388, 417 cm-1 and 521 cm-1 assigned to Si substrate. The average nano grain size is measured by atomic force microscopy (AFM). It was found that the hardness was strongly dependent on the roughness of the films, the maximum of which was achieved at 20.01 GPa. The optical band gap of Al 2 O 3 films was found to be in the range of 5.55 eV. All these results were analyzed and presented as a function of the deposition parameters and composition, and crystalline phases excited in the films.

Effect of deposition parameters on properties of TiO2 films deposited by reactive magnetron sputtering

2017 ◽  
Vol 43 (14) ◽  
pp. 10991-10998 ◽  
Author(s):  
Bo Wang ◽  
Shicheng Wei ◽  
Lei Guo ◽  
Yujiang Wang ◽  
Yi Liang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Deposition Parameters
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