Measuring Particles and Bubbles in Process Chemicals at Controlled Temperatures

1999 ◽  
Vol 42 (5) ◽  
pp. 30-35
Author(s):  
Mindi Xu ◽  
Wei-Ching Li

Microbubbles in semiconductor manufacturing process chemicals can be produced by mechanical disturbance to the chemicals or by changing the temperature and pressure. Bubbles suspended in liquid are easily miscounted as particles when an optical particle counter is used for measuring particles. A new technique, controlling sample temperature, has been developed. Samples for measuring particles are refrigerated to a temperature that eliminates bubbles and then introduced into a particle counter for measurement. The results from these experiments indicate that sample temperature strongly affects the particle counts due to the bubbles in the liquids. Effective temperatures for bubble suppression in several process chemicals have been selected based on the experiments. To better understand bubble suppression by controlling temperature, theoretical simulations for the microbubbles in the chemicals were conducted at various temperature conditions. The results from the experiments and the theoretical simulations are compared.

Author(s):  
Anqi Qiu ◽  
William Lowe ◽  
Mridul Arora

Abstract Nanoprobing systems have evolved to meet the challenges from recent innovations in the semiconductor manufacturing process. This is demonstrated through an exhibition of standard SRAM measurements on TSMC 7 nm FinFET technology. SEM based nanoprober is shown to meet or exceed the requirements for measuring 7nm technology and beyond. This paper discusses in detail of the best-known methods for nanoprobing on 7nm technology.


Author(s):  
S. Bezantakos ◽  
M. Costi ◽  
K. Barmpounis ◽  
P. Antoniou ◽  
P. Vouterakos ◽  
...  

RSC Advances ◽  
2015 ◽  
Vol 5 (126) ◽  
pp. 103901-103906 ◽  
Author(s):  
Fuyun He ◽  
Zhisheng Zhang

In semiconductor manufacturing, the multilayer overlay lithography process is a typical multistage manufacturing process; one of the key factors that restrict the reliability and yield of integrated circuit chips is overlay error between the layers.


2014 ◽  
Vol 7 (4) ◽  
pp. 3253-3299
Author(s):  
B. G. Martinsson ◽  
J. Friberg ◽  
S. M. Andersson ◽  
A. Weigelt ◽  
M. Hermann ◽  
...  

Abstract. Inter-comparison of results from two kinds of aerosol systems in the CARIBIC (Civil Aircraft for the Regular Investigation of the atmosphere Based on an Instrument Container) passenger aircraft based observatory, operating during intercontinental flights at 9–12 km altitude, is presented. Aerosol from the lowermost stratosphere (LMS), the extra-tropical upper troposphere (UT) and the tropical mid troposphere (MT) were investigated. Aerosol particle volume concentration measured with an optical particle counter (OPC) is compared with analytical results of the sum of masses of all major and several minor constituents from aerosol samples collected with an impactor. Analyses were undertaken with accelerator-based methods particle-induced X-ray emission (PIXE) and particle elastic scattering analysis (PESA). Data from 48 flights during one year are used, leading to a total of 106 individual comparisons. The ratios of the particle volume from the OPC and the total mass from the analyses were in 84% within a relatively narrow interval. Data points outside this interval are connected with inlet-related effects in clouds, large variability in aerosol composition, particle size distribution effects and some cases of non-ideal sampling. Overall, the comparison of these two CARIBIC measurements based on vastly different methods show good agreement, implying that the chemical and size information can be combined in studies of the MT/UT/LMS aerosol.


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