P-66: High Deposition Rate Technique of Magnesium Oxide Thin Film in Oxide Mode for Plasma Display Panel Applications

2004 ◽  
Vol 35 (1) ◽  
pp. 495
Author(s):  
Young Wook Choi ◽  
Jeehyun Kim
Keyword(s):  
Thin Film ◽  
Magnesium Oxide ◽  
Deposition Rate ◽  
Oxide Thin Film ◽  
High Deposition Rate ◽  
Plasma Display Panel ◽  
Plasma Display

The effect of Fe-doped magnesium oxide thin film in alternative current plasma display panel

2009 ◽  
Vol 517 (14) ◽  
pp. 4152-4155 ◽  
Author(s):  
Jung-Woo Ok ◽  
Don-Kyu Lee ◽  
Dong-Hyun Kim ◽  
Hae June Lee ◽  
Ho-Jun Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnesium Oxide ◽  
Oxide Thin Film ◽  
Plasma Display Panel ◽  
Plasma Display ◽  
Alternative Current

Effects of MgO thin film thickness and deposition rate on the lifetime of ac plasma display panel

2005 ◽  
Vol 197 (2-3) ◽  
pp. 223-228 ◽  
Author(s):  
Chung-Hoo Park ◽  
Joon-Young Choi ◽  
Min-Suk Choi ◽  
Young-Kee Kim ◽  
Ho-Jun Lee
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Deposition Rate ◽  
Plasma Display Panel ◽  
Thin Film Thickness ◽  
Plasma Display

Effect of magnesium oxide passivation on the performance of amorphous indium–gallium–zinc-oxide thin film transistors

2012 ◽  
Vol 520 (10) ◽  
pp. 3783-3786 ◽  
Author(s):  
Dong Youn Yoo ◽  
Eugene Chong ◽  
Do Hyung Kim ◽  
Byeong Kwon Ju ◽  
Sang Yeol Lee
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Magnesium Oxide ◽  
Thin Film Transistors ◽  
Oxide Thin Film ◽  
Indium Gallium Zinc Oxide ◽  
Zinc Oxide Thin Film ◽  
Indium Gallium
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