High Throughput Spectroscopic Catalyst Screening via Surface Plasmon Spectroscopy

2015 ◽  
Author(s):  
Paul Mulvaney
2010 ◽  
Vol 99 (12) ◽  
pp. 4028-4036 ◽  
Author(s):  
Victor Yashunsky ◽  
Vladislav Lirtsman ◽  
Michael Golosovsky ◽  
Dan Davidov ◽  
Benjamin Aroeti

2020 ◽  
Vol 28 (14) ◽  
pp. 20624
Author(s):  
Youjun Zeng ◽  
Xueliang Wang ◽  
Jie Zhou ◽  
Ruibiao Miyan ◽  
Junle Qu ◽  
...  

Author(s):  
Hyunwoo Hwang ◽  
Won-Sup Lee ◽  
No-Cheol Park ◽  
Hyunseok Yang ◽  
Young-Pil Park ◽  
...  

Recently, plasmonic nanolithography is studied by many researchers (1, 2 and 3). This presented a low-cost and high-throughput approach to maskless nanolithography technique that uses a metallic sharp-ridge nanoaperture with a high strong nanometer-sized optical spot induced by surface plasmon resonance. However, these nanometer-scale spots generated by metallic nanoapertures are formed in only the near-field region, which makes it very difficult to pattern above the photoresist surface at high-speeds.


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