In Situ Growth of a Novel Nanoscaled Rock Salt Titanium Zirconium Nitride Phase in a Silicon Nitride Matrix

2021 ◽  
Author(s):  
Mirna Chaker Bechelany ◽  
Abhijeet Lale ◽  
Maxime Balestrat ◽  
Christel Gervais ◽  
Sylvie Malo ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Rock Salt ◽  
Zirconium Nitride ◽  
Nitride Phase ◽  
In Situ Growth ◽  
Titanium Zirconium

scholarly journals Processing and Characterization of Silicon Nitride Nanofiber Paper

2013 ◽  
Vol 2013 ◽  
pp. 1-7 ◽  
Author(s):  
Kei-Peng Jen ◽  
Ronald Warzoha ◽  
Ji Guo ◽  
Michael Tang ◽  
Sridhar Santhanam
Keyword(s):  
Silicon Nitride ◽  
Thermal Insulation ◽  
Reduction Process ◽  
Thermal Characterization ◽  
Nitride Phase ◽  
Mechanical Stiffness ◽  
Precursor Material ◽  
Processing Step

Papers of silicon nitride nanofibers were synthesized by a carbothermal reduction process. These nanofiber papers were synthesized in situ and did not require a secondary processing step. The process utilized silica nanopowders and silica gel as the precursor material. Processing geometry played a crucial role in regulating the growth of the nanofiber papers. Characterization of the nanofiber papers indicated that the nanofibers were of the alpha silicon nitride phase. Both mechanical stiffness and strength of the nanofiber papers were measured. Thermal conductivity and specific heat of the papers were also measured and were found to be lower than many common thermal insulation materials at much smaller thicknesses and were comparable to those values that are typically reported for carbon-nanotube-based buckypaper. Results of the mechanical and thermal characterization indicate that these silicon nitride nanofiber papers can be utilized for specialized thermal insulation applications.

Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy

1997 ◽  
Vol 112 ◽  
pp. 75-81 ◽  
Author(s):  
Shin Yokoyama ◽  
Hiroshi Goto ◽  
Takahiro Miyamoto ◽  
Norihiko Ikeda ◽  
Kentaro Shibahara
Keyword(s):  
Silicon Nitride ◽  
Absorption Spectroscopy ◽  
Atomic Layer ◽  
In Situ Growth ◽  
Infrared Reflection Absorption Spectroscopy ◽  
Infrared Reflection ◽  
Controlled Deposition

PECVD in-situ growth of silicon quantum dots in silicon nitride from silane and nitrogen

2009 ◽  
Vol 159-160 ◽  
pp. 77-79 ◽  
Author(s):  
Lucia V. Mercaldo ◽  
Paola Delli Veneri ◽  
Emilia Esposito ◽  
Ettore Massera ◽  
Iurie Usatii ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Silicon Nitride ◽  
In Situ Growth ◽  
Silicon Quantum Dots

Epitaxial growth manner and structure of superconducting oxide films

1990 ◽  
Vol 48 (4) ◽  
pp. 2-3
Author(s):  
Yoshichika Bando ◽  
Takahito Terashima ◽  
Kenji Iijima ◽  
Kazunuki Yamamoto ◽  
Kazuto Hirata ◽  
...  
Keyword(s):  
Ultrathin Films ◽  
Film Surface ◽  
High Energy ◽  
Epitaxial Films ◽  
Layer By Layer ◽  
Initial Growth ◽  
In Situ Growth ◽  
High Quality ◽  
Activated Reactive Evaporation

The high quality thin films of high-Tc superconducting oxide are necessary for elucidating the superconducting mechanism and for device application. The recent trend in the preparation of high-Tc films has been toward “in-situ” growth of the superconducting phase at relatively low temperatures. The purpose of “in-situ” growth is to attain surface smoothness suitable for fabricating film devices but also to obtain high quality film. We present the investigation on the initial growth manner of YBCO by in-situ reflective high energy electron diffraction (RHEED) technique and on the structural and superconducting properties of the resulting ultrathin films below 100Å. The epitaxial films have been grown on (100) plane of MgO and SrTiO, heated below 650°C by activated reactive evaporation. The in-situ RHEED observation and the intensity measurement was carried out during deposition of YBCO on the substrate at 650°C. The deposition rate was 0.8Å/s. Fig. 1 shows the RHEED patterns at every stage of deposition of YBCO on MgO(100). All the patterns exhibit the sharp streaks, indicating that the film surface is atomically smooth and the growth manner is layer-by-layer.

In situ growth of SrTiO3 thin films prepared by AACVD from strontium and titanium oxide bisdipivaloylmethanates

1997 ◽  
Vol 101-103 (1-2) ◽  
pp. 183-190 ◽  
Author(s):  
J Peña
Keyword(s):  
Thin Films ◽  
Titanium Oxide ◽  
In Situ Growth

In-situ growth of cerium nanoparticles for chrome-free, corrosion resistant anodic coatings

2021 ◽  
Vol 410 ◽  
pp. 126958
Author(s):  
Linnea Selegård ◽  
Thirza Poot ◽  
Peter Eriksson ◽  
Justinas Palisaitis ◽  
Per O.Å. Persson ◽  
...  
Keyword(s):  
In Situ Growth ◽  
Corrosion Resistant

In-situ growth of Fe nanoparticles encapsulated by carbon onions with controllable thickness on graphene nanoribbon-reinforced graphene

Carbon ◽  
2021 ◽  
Vol 174 ◽  
pp. 423-429
Author(s):  
Xinlu Li ◽  
Seoung-Ki Lee ◽  
Junwei Sha ◽  
Yuanyuan Deng ◽  
Yujie Zhao ◽  
...  
Keyword(s):  
Graphene Nanoribbon ◽  
In Situ Growth ◽  
Fe Nanoparticles ◽  
Carbon Onions
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