scholarly journals Laboratory evaluation of performance and durability of polymer grouts for subsurface hydraulic/diffusion barriers. Informal report, October 1993--May 1994

10.2172/32574 ◽  
1994 ◽  
Author(s):  
J.H. Heiser ◽  
L.W. Milian
Keyword(s):  
Diffusion Barriers ◽  
Laboratory Evaluation ◽  
Evaluation Of Performance

Laboratory evaluation of performance of porous ultra-thin overlay

2019 ◽  
Vol 204 ◽  
pp. 28-40 ◽  
Author(s):  
Ziming Liu ◽  
Sang Luo ◽  
Xun Quan ◽  
Xiaohao Wei ◽  
Xu Yang ◽  
...  
Keyword(s):  
Laboratory Evaluation ◽  
Evaluation Of Performance

SURFACTANT-ENHANCED AIR SPARGING: LABORATORY EVALUATION OF PERFORMANCE

2003 ◽  
Vol 2003 (12) ◽  
pp. 176-191 ◽  
Author(s):  
Theodore J. Kremer ◽  
John S. Gierke ◽  
Jaroslaw Drelich ◽  
Paul T. Imhoff
Keyword(s):  
Laboratory Evaluation ◽  
Air Sparging ◽  
Evaluation Of Performance

A Laboratory Evaluation of Performance Following a Daytime Nap Under Zaleplon and Placebo Conditions

2003 ◽  
Author(s):  
Jeffery N. Whitmore ◽  
Joseph R. Fischer ◽  
Barton Jr. ◽  
Hickey Emily C. ◽  
Cardenas Patrick A. ◽  
...  
Keyword(s):  
Laboratory Evaluation ◽  
Evaluation Of Performance ◽  
Daytime Nap

A laboratory evaluation of performance following a daytime nap under zaleplon and placebo conditions

2003 ◽  
Author(s):  
Jeffery Whitmore ◽  
◽  
Joseph Fischer ◽  
Emily Barton ◽  
Patrick Hickey ◽  
...  
Keyword(s):  
Laboratory Evaluation ◽  
Evaluation Of Performance ◽  
Daytime Nap

Stress Relaxation and the Formation of Silicides in the Process of the Crystallization of NI-NB Films on SI

1991 ◽  
Vol 49 ◽  
pp. 898-899
Author(s):  
N. Rozhanski ◽  
V. Lifshitz
Keyword(s):  
Thin Films ◽  
Stress Relaxation ◽  
Integrated Circuits ◽  
Direct Evidence ◽  
Alloy Film ◽  
Diffusion Barriers ◽  
Effective Barrier

Thin films of amorphous Ni-Nb alloys are of interest since they can be used as diffusion barriers for integrated circuits on Si. A native SiO2 layer is an effective barrier for Ni diffusion but it deformation during the crystallization of the alloy film lead to the appearence of diffusion fluxes through it and the following formation of silicides. This study concerns the direct evidence of the action of stresses in the process of the crystallization of Ni-Nb films on Si and the structure of forming NiSi2 islands.

The reaction of amorphous Ni-Nb films with Si in the presence of a native SiO2 layer

1990 ◽  
Vol 48 (4) ◽  
pp. 664-665
Author(s):  
N. Rozhanski ◽  
A. Barg
Keyword(s):  
High Temperature ◽  
Crystallization Temperature ◽  
Diffusion Barriers ◽  
Sio2 Layer ◽  
Si Substrate ◽  
Cross Sectional ◽  
Plan View ◽  
Temperature Range ◽  
Sputter Deposited

Amorphous Ni-Nb alloys are of potential interest as diffusion barriers for high temperature metallization for VLSI. In the present work amorphous Ni-Nb films were sputter deposited on Si(100) and their interaction with a substrate was studied in the temperature range (200-700)°C. The crystallization of films was observed on the plan-view specimens heated in-situ in Philips-400ST microscope. Cross-sectional objects were prepared to study the structure of interfaces.The crystallization temperature of Ni5 0 Ni5 0 and Ni8 0 Nb2 0 films was found to be equal to 675°C and 525°C correspondingly. The crystallization of Ni5 0 Ni5 0 films is followed by the formation of Ni6Nb7 and Ni3Nb nucleus. Ni8 0Nb2 0 films crystallise with the formation of Ni and Ni3Nb crystals. No interaction of both films with Si substrate was observed on plan-view specimens up to 700°C, that is due to the barrier action of the native SiO2 layer.

Sign in / Sign up

Export Citation Format

Share Document