scholarly journals Controlling Quantum Wave Packet of Electronic Motion on Field-Dressed Coulomb Potential of H2+ by Carrier-Envelope Phase-Dependent Strong Field Laser Pulses

Author(s):  
Mohammad Noh Daud

Solving numerically a non-Born-Oppenheimer time-dependent Schrödinger equation to study the dissociative-ionization of H subjected to strong field six-cycle laser pulses (I = 4 × 10 W/cm, λ = 800 nm) leads to newly ultrafast images of electron dynamics in H. The electron distribution in H oscillates symmetrically with laser cycle with θ + π periodicity and gets trapped between two protons for about 8 fs by a Coulomb potential well. Nonetheless, this electron symmetrical distribution breaks up for the H internuclear separation larger than 9 a.u. in the field-free region at a time duration of 24 fs as a result of the distortion of Coulomb potential where the ejected electron preferentially localizes in one of the double-well potential separated by the inner Coulomb potential barrier. Moreover, controlling laser carrier-envelope phase θ enables one to generate the highest total asymmetry A of 0.75 and -0.75 at 10 and 190, respectively, associated with the electron preferential directionality being ionized to the left or the right paths along the H molecular axis. Thus the laser-controlled electron slightly reorganizes its position accordingly to track the shift in the position of the protons despite much heavier the proton’s mass.

2019 ◽  
Vol 21 (4) ◽  
pp. 045003 ◽  
Author(s):  
Christian Heide ◽  
Tobias Boolakee ◽  
Takuya Higuchi ◽  
Heiko B Weber ◽  
Peter Hommelhoff

Author(s):  
Fréderic ONGONWOU ◽  
Hugues Merlain TETCHOU ◽  
Thierry Blanchard EKOGO ◽  
Bakari ABDOURAMAN ◽  
Moïse Godefroy KWATO

We examine above-threshold ionization spectra of model atomic hydrogen in short infrared laser pulses by solving the one-electron time-dependent Schr\“odinger equation in momentum space. To bypass the difficulty of solving the time-dependent Schr\”odinger equation with the interacting nonlocal Coulomb potential, we have recently formulated an alternative \emph{ab initio} approach [Ongonwou et al. Annals of Physics {\bf 375}, 471 (2016)], which is relied on the expansion of the atomic wavefunction and the interacting nonlocal Coulomb potential on a discrete basis set of Coulomb Sturmians in momentum space. As far as short infrared laser pulses are concerned, we have numerically evaluated the photoelectron momentum distributions, angular distributions and bound states populations. The results obtained from our accurate new computationally method are compared against predictions of other time-dependent calculations in the literature. This new theoretical model shows its sensitivity to the carrier-envelope phase of the laser pulse and captures the left-right dependence of the emitted photoelectrons momentum and angular distributions. More precisely, short pulses manifest significant dependence of the differential ionization probability on carrier-envelope phase of the laser pulse and broken forward-backward symmetry in the angular distributions.


2013 ◽  
Vol 41 ◽  
pp. 02011
Author(s):  
B. E. Schmidt ◽  
M. Möller ◽  
A. M. Sayler ◽  
A. D. Shiner ◽  
G. Vampa ◽  
...  

2004 ◽  
Vol 79 (6) ◽  
pp. 673-677 ◽  
Author(s):  
C.P. Hauri ◽  
W. Kornelis ◽  
F.W. Helbing ◽  
A. Heinrich ◽  
A. Couairon ◽  
...  

2008 ◽  
Vol 16 (4) ◽  
Author(s):  
P. Wachulak ◽  
M. Capeluto ◽  
C. Menoni ◽  
J. Rocca ◽  
M. Marconi

AbstractThe recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to nanotechnology and nanofabrication. In this paper we review the advances in the utilization of EUV lasers in nanopatterning. In particular we show results of the nanopatterning using a table-top capillary discharge laser producing 0.12-mJ laser pulses with 1.2-ns time duration at a wavelength λ = 46.9 nm. The nanopatterning was realized by interferometric lithography using a Lloyd’s mirror interferometer. Two standard photoresists were used in this work, polymethyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ). Pillars with a full width half maximum (FWHM) diameter of 60 nm and holes with FWHM diameter of 130 nm were obtained over areas in excess of 500×500 μm2.


2015 ◽  
Vol 635 (9) ◽  
pp. 092122
Author(s):  
N Camus ◽  
L Fechner ◽  
D G Arbó ◽  
C Lemell ◽  
S Nagele ◽  
...  

2021 ◽  
Vol 144 ◽  
pp. 107394
Author(s):  
M. Kozák ◽  
P. Peterka ◽  
J. Dostál ◽  
F. Trojánek ◽  
P. Malý

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