Distribution of the charged particles of a gas-discharge laser plasma in a transverse magnetic field. I. Calculation model

The paper considers a physical and mathematical model describing the influence of an external transverse magnetic field on the distribution of charged particles in a positive column of a gas discharge. This model is developed in relation to the weakly ionized plasma of a gas-discharge laser. In this case, the plasma flow is considered as an analog of a liquid consisting of two practically independent components – electrons and ions.

Distribution of the charged particles of a gas-discharge laser plasma in a transverse magnetic field. II. Experimental study

The paper presents an experimental verification of the adequacy of a physical and mathematical model describing the influence of an external transverse magnetic field on the distribution of the charged particles in a positive column of a gas discharge. A gas-discharge laser located in a transverse magnetic field was used to conduct the study. The vacuum installation allows pumping out the system and feeding the gas mixture into it under a certain pressure. The data obtained during the experiments differ from the calculated ones by no more than 4–5 %.

A Brief Review on Recent Development of Carbon Nanotubes by Chemical Vapor Deposition

Development of carbon nanotubes was done by several methods like arc discharge, laser ablation, silane solution, flame synthesis method but the standard or famous technique using chemical vapor deposition (CVD). CVD is one of the approaches to develop CNT, due to easy control of the reaction course and high purity of the obtained materials. Various type of CVD present like thermal CVD, plasma enhanced CVD, or microwave plasma CVD. These kinds of types give the different advantage and drawbacks to the production of CNT and its preparations.

Ablation of single-crystalline cesium iodide by extreme ultraviolet capillary-discharge laser

Extreme ultraviolet (XUV) capillary-discharge lasers (CDLs) are a suitable source for the efficient, clean ablation of ionic crystals, which are obviously difficult to ablate with conventional, long-wavelength lasers. In the present study, a single crystal of cesium iodide (CsI) was irradiated by multiple, focused 1.5-ns pulses of 46.9-nm radiation delivered from a compact XUV-CDL device operated at either 2-Hz or 3-Hz repetition rates. The ablation rates were determined from the depth of the craters produced by the accumulation of laser pulses. Langmuir probes were used to diagnose the plasma plume produced by the focused XUV-CDL beam. Both the electron density and electron temperature were sufficiently high to confirm that ablation was the key process in the observed CsI removal. Moreover, a CsI thin film on MgO substrate was prepared by XUV pulsed laser deposition; a fraction of the film was detected by X-ray photoelectron spectroscopy.