The TiO2thin films were prepared using Ti(dpm)2(OPri)2and Ti(OPri)4(dpm = 2,2,6,6-tetramethylheptane-3,5-dione,Pri= isopropyl) as the precursors. The volatile compounds Fe[(C2H5)2NCS2]3and [(CH3)C]2S2were used to prepare doped TiO2films. The synthesis was done in vacuum or in the presence of Ar and O2. The pressure in the CVD chamber was varied between1.2×10−4 mbar and 0.1 mbar, with the system working either in the molecular beam or gas flow regime. Physical, chemical, and photocatalytic properties of the (Fe, S)-doped TiO2films were studied. Those TiO2:(Fe, S) films prepared from the Ti(OPri)4precursor show increased photocatalytic activities, very close to those of Degussa P25 powder in UV region.
TiO2:(Fe, S) Thin Films Prepared from Complex Precursors by CVD, Physical Chemical Properties, and Photocatalysis