Structure and chemical composition of BN thin films grown by pulsed-laser deposition (PLD)

1995 ◽  
Vol 86 (1-4) ◽  
pp. 165-169 ◽  
Author(s):  
T. Klotzbücher ◽  
W. Pfleging ◽  
M. Mertin ◽  
D.A. Wesner ◽  
E.W. Kreutz
2009 ◽  
Vol 255 (10) ◽  
pp. 5260-5263 ◽  
Author(s):  
D. Craciun ◽  
G. Socol ◽  
N. Stefan ◽  
G. Bourne ◽  
V. Craciun

1995 ◽  
Vol 4 (4) ◽  
pp. 370-374 ◽  
Author(s):  
W. Pfleging ◽  
T. Klotzbücher ◽  
D.A. Wesner ◽  
E.W. Kreutz

2014 ◽  
Vol 302 ◽  
pp. 124-128 ◽  
Author(s):  
D. Craciun ◽  
G. Socol ◽  
N. Stefan ◽  
G. Dorcioman ◽  
M. Hanna ◽  
...  

2012 ◽  
Vol 186 ◽  
pp. 160-163
Author(s):  
Agnieszka Radziszewska

The paper presented the structure (TEM), morphology and chemical composition (EDS) of the -Al-Mg thin films and Al-Mg-Ni multilayer obtained by pulsed laser deposition (PLD). This films were deposited using Nd:YAG laser. The different process parameters were applied. The Al-Mg film was obtained by application of the laser wavelength (=355 nm) and substrate temperature (Ts) 200 oC. Whereas the Al-Mg-Ni multilayer was produced at lower laser wavelength (=266 nm) and at room temperature of the substrate. For preparation of both films the same laser fluence (q=4.7 J/cm2) was used. The Al-Mg possessed nanocrystalline structure with the areas where only columnar Al crystals occurred. EDS of this thin film exhibited that in the nanocrystalline areas the chemical composition corresponded to the target content of Al and Mg. While Al-Mg-Ni multilayer composed of six layers. In this case Al-Mg layers were thinner then Ni layers. In the multilayer structure the fcc Al0.65Mg0.35 and fcc Ni phases was revealed.


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