NITROGEN INFLUENCE ON THE CORROSION RESISTANCE OF THIN Ti-O-N FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING
The electrochemical and gravimetric methods were used to study the effect of nitrogen using in the reaction mixture during magnetron deposition on the Ti-O-N films corrosion-electrochemical behavior. Polarization studies of the films electrochemical dissolution in aque-ous solution of 3 % NaCl in a potentiostatic mode are presented. It was found that upon dis-solution of the films, passivation, activation, and passivation of the coating surface are ob-served, associated with the formation of oxide films and titanium chlorides on the sample sur-face. It has been proved that thin films obtained with a high nitrogen content exhibit higher corrosion resistance. In this work, the following corrosion parameters were calculated: mass, depth and current indicators.